2015
DOI: 10.1016/j.vacuum.2014.10.016
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Deposition of porous titanium oxide thin films as anode material for dye sensitized solar cells

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Cited by 27 publications
(38 citation statements)
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“…In this context and in view of the material science challenges, plasma techniques appear as an ideal technological platform to synthesize these materials. Indeed, these technologies are known as "green" technologies, since they allow for good control of the material properties and their industrial transfer has been demonstrated in many fields such as the glass industry or microelectronics [17][18][19][20][21]. Among these technologies, magnetron sputtering (MS) is usually used to grow dense thin films of various materials (from metal to polymer coatings) [21][22][23].…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…In this context and in view of the material science challenges, plasma techniques appear as an ideal technological platform to synthesize these materials. Indeed, these technologies are known as "green" technologies, since they allow for good control of the material properties and their industrial transfer has been demonstrated in many fields such as the glass industry or microelectronics [17][18][19][20][21]. Among these technologies, magnetron sputtering (MS) is usually used to grow dense thin films of various materials (from metal to polymer coatings) [21][22][23].…”
Section: Introductionmentioning
confidence: 99%
“…Nevertheless, when used in the glancing angle deposition (GLAD) configuration, it has been demonstrated that nanostructurated coatings for the microstructure can be controlled. As an example, we recently reported on the growth of Ti and TiO 2 nanostructurated films by using this approach [19,20].…”
Section: Introductionmentioning
confidence: 99%
“…Co‐reactive magnetron sputtering experiments were carried out in a dedicated vacuum chamber fully described elsewhere . Briefly, a Ti target (2 in.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…TiO 2 is a wide bandgap n‐type semiconductor (~3.0 to 3.2 eV) which is nowadays efficiently used as photoanode in n‐DSSCs due to its high transparency in the near UV‐visible light region . Furthermore, TiO 2 possesses a good chemical affinity to carboxylic acid, which is an easily synthetically accessible anchoring group for many dyes and its specific surface area is easily tunable . In this context, the development of TiO 2 ‐based photocathode would be particularly interesting for large scale production of t‐DSSCs as it would limit the complexity of the deposition systems.…”
Section: Introductionmentioning
confidence: 99%
“…Compact layer and thin film of TiO 2 , ZnO, Nb 2 O 5 , Cs 2 CO 3 , V 2 O 5 , CdS are mostly used between ITO and the top electrode in the inverted geometry [21e25] and this transparent electrode coted ITO act as cathode. Also porous and nanoporous TiO 2 film used as charge separator for dye-sensitive solar cell [26,27].…”
mentioning
confidence: 99%