2009
DOI: 10.1016/j.tsf.2009.02.061
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Deposition of low-resistivity gallium-doped zinc oxide films by low-temperature radio-frequency magnetron sputtering

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Cited by 41 publications
(15 citation statements)
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“…In this regard, crystalline gallium zinc oxide (GZO) nanostructures have been obtained by thermal evaporation [18], spray pyrolysis [19], r.f. magnetron sputtering [20], pulsed laser deposition [21], molecular-beam epitaxy [22], metaleorganic chemical vapor deposition [23], arc-discharge [24], hydrothermal process [25], solegel technique [26], among others. Nevertheless, extensive descriptions concerning the effect of optoelectronic doping on the morphology, structural and vibrational properties are scarce [27].…”
Section: Introductionmentioning
confidence: 99%
“…In this regard, crystalline gallium zinc oxide (GZO) nanostructures have been obtained by thermal evaporation [18], spray pyrolysis [19], r.f. magnetron sputtering [20], pulsed laser deposition [21], molecular-beam epitaxy [22], metaleorganic chemical vapor deposition [23], arc-discharge [24], hydrothermal process [25], solegel technique [26], among others. Nevertheless, extensive descriptions concerning the effect of optoelectronic doping on the morphology, structural and vibrational properties are scarce [27].…”
Section: Introductionmentioning
confidence: 99%
“…Also, in the lower working pressure, the mean free paths of the particles in plasma are longer than those at higher working pressures because fewer collisions occur within the plasma. 15) Figures 5(a) and 5(b) show the deposition rate, resistivity, carrier concentration, and Hall mobility of the ATO films deposited on a PES flexible substrate as a function of the different RF powers with a working pressure of 0.67 Pa. As shown in Fig. 5(a), as the RF power increased from 50 to 150 W, the deposition rate increased from 7.14 to 21.2 nm.…”
Section: Resultsmentioning
confidence: 95%
“…power, substrate heating [35e37], target-to substrate distance [38], process pressure [39] etc. have great influence on the film characteristics.…”
Section: Introductionmentioning
confidence: 99%