Deposition of diamond-like carbon thin films by the high power impulse magnetron sputtering method

Wiatrowski, A.; Kijaszek, Wojciech; Posadowski, Witold; Oleszkiewicz, W.; Jadczak, J.; Kunicki, Piotr

doi:10.1016/j.diamond.2017.01.007

Cited by 15 publications

(10 citation statements)

References 29 publications

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“…The hardness of the prepared DLC films was 37 GPa when the pulse width was 7 μs and the applied voltage was −1200 V. It was said that the highly ionized carbon species in HiPIMS was responsible for the high hardness of the DLC because of a high content of sp 3 fraction in the films. Wiatrowski et al [93] claimed that ions bombarding and depositing energy on the substrate surface during the growth of DLC films improved the stability of the sp 3 bonds and the properties of the deposited DLC film during the HiPIMS process. The prepared DLC films were characterized by a high refractive index (n=2.45 at 400 nm) and a high sp 3 fraction content (70%-80%, calculated from the acquired Raman scattering spectra).…”

Section: Hard Coatingsmentioning

confidence: 99%

High power impulse magnetron sputtering and its applications

Yang

Liu

Chen

2018

Plasma Sci. Technol.

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High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process, which has been demonstrated to be advantageous for better quality coating. Therefore, the mechanism of the HiPIMS technique has recently been investigated. In this paper, the current knowledge of HiPIMS is described. We focus on the mechanical properties of the deposited thin film in the latest applications, including hard coatings, adhesion enhancement, tribological performance, and corrosion protection layers. A description of the electrical, optical, photocatalytic, and functional coating applications are presented. The prospects for HiPIMS are also discussed in this work.

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Section: Hard Coatingsmentioning

confidence: 99%

High power impulse magnetron sputtering and its applications

Yang

Liu

Chen

2018

Plasma Sci. Technol.

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“…It is not possible to increase the anode-cathode voltage (that influences the plasma particles energy) without a significant increase in the discharge current and therefore in the discharge power [10]. The high target power density causes problems with the target cooling and stability of sputtering as the arcing is likely to take place during standard, direct current processes [11].…”

Section: Introductionmentioning

confidence: 99%

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

et al. 2018

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In this paper, a comparison of TiO2 thin films prepared by magnetron sputtering with a continuous and pulsed gas flow was presented. Structural, surface, optical, and mechanical properties of deposited titanium dioxide coatings were analyzed with the use of a wide range of measurement techniques. It was found that thin films deposited with a gas impulse had a nanocrystalline rutile structure instead of fibrous-like anatase obtained with a continuous gas flow. TiO2 thin films deposited with both techniques were transparent in the visible wavelength range, however, a much higher refractive index and packing density were observed for coatings deposited by the pulsed gas technique. The application of a gas impulse improved the hardness and scratch resistance of the prepared TiO2 thin films.

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“…Consequently, the effectiveness of gas ionization by electrons was temporarily reduced as well. This phenomenon can eliminate formation of metallic micro-particle inclusions in deposited film [ 45 ].…”

Section: Resultsmentioning

confidence: 99%

“…The films were deposited within 300 pulses, with a total time of 900 s and voltage of 900 V. The number of the pulses was controlled by AVR Arduino Uno microcontroller electronics. The HiPIMS setup was described in detail in our previous work [ 45 ].…”

Section: Methodsmentioning

confidence: 99%

High Power Impulse Magnetron Sputtering of In2O3/Sn Cold Sprayed Composite Target

2021

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High Power Impulse Magnetron Sputtering (HiPIMS) was used for deposition of indium tin oxide (ITO) transparent thin films at low substrate temperature. A hybrid-type composite target was self-prepared by low-pressure cold spraying process. Prior to spraying In2O3 and oxidized Sn powders were mixed in a volume ratio of 3:1. Composite In2O3/Sn coating had a mean thickness of 900 µm. HiPIMS process was performed in various mixtures of Ar:O2: (i) 100:0 vol.%, (ii) 90:10 vol.%, (iii) 75:25 vol.%, (iv) 50:50 vol.%, and (v) 0:100 vol.%. Oxygen rich atmosphere was necessary to oxidize tin atoms. Self-design, simple high voltage power switch capable of charging the 20 µF capacitor bank from external high voltage power supply worked as a power supply for an unbalanced magnetron source. ITO thin films with thickness in the range of 30–40 nm were obtained after 300 deposition pulses of 900 V and deposition time of 900 s. The highest transmission of 88% at λ = 550 nm provided 0:100 vol. % Ar:O2 mixture, together with the lowest resistivity of 0.03 Ω·cm.

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Deposition of diamond-like carbon thin films by the high power impulse magnetron sputtering method

Cited by 15 publications

References 29 publications

High power impulse magnetron sputtering and its applications

High power impulse magnetron sputtering and its applications

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

High Power Impulse Magnetron Sputtering of In2O3/Sn Cold Sprayed Composite Target

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