This paper is concerned with the nature and morphology of deposited Carbon -Alumina coatings produced under various discharging conditions of the Impulse Plasma Deposition (IPD) process. The deposition of the coating material was carried out on a non-heated steel substrate by means of plasma pulses generated from a coaxial plasma gun. The pulsed plasma mainly consists of two kinds of ions: working gas ions and inner electrode ions. Coatings were produced by a number of plasma pulses (50 -200) from 15.42 µF capacitor bank at 13.5 kV discharging voltage. The microstructure of the deposited films was observed using scanning electron microscope (SEM). Structural features were greatly affected by the type of the working gas which controls the ionization potential. Using the Acetylene (C 2 H 2 ) only as a working gas produces a layer of graphite and coarse alumina particles (AL 2 O 3 ) with non uniform distribution. Mixing the used gas with a molecular gas (either N 2 or H 2 ) enhances the ionization and gives more uniform distribution of finer alumina particles.