Deposition and Patterning of Polycrystalline Diamond Films Using Traditional Photolithography and Reactive Ion Etching

Abstract

Abstract:Given the exceptional characteristics of diamond films, they have become increasingly popular in the fields of medicine, microelectronics, and detector electronics. However, despite all the advantages, there are many technological problems that complicate their widespread application and impose limitations on diamond use in technological processes. In this study, we proposed a new technique for obtaining a complex topology of polycrystalline diamond coatings by selective seeding of the substrate by nucleation centers and subsequent surface treatment with reactive ion etching to reduce the number of parasitic particles. As a result, diamond films were obtained with a high particle concentration in the film region and high repeatability of the pattern. Moreover, parasitic particles influenced neutralization in areas where film coverage was not needed. The effect of the diamond nanoparticle concentration in a photoresist and the effect of reactive ion etching on the formation of a continuous film and the removal of parasitic nucleation centers were examined. The relative simplicity, low power consumption, and high efficiency of this method make it attractive for both industrial and scientific applications.

Low‐Coherence Interferometer with Nanocrystalline Diamond Films with Potential Application to Measure Small Biological Samples

“…Thin films made of materials with refractive index which can be adjusted by technological process such as ZnO, TiO 2 , nanodiamond can be used to modify the reflectance of the cavity interface. Thin diamond films are one of the most promising materials in this field, as they combine a high resistance to mechanical damage with outstanding chemical resistance, offering prospects for long sensor life expectancy …”

“…Thin diamond films are one of the most promising materials in this field, as they combine a high resistance to mechanical damage with outstanding chemical resistance, offering prospects for long sensor life expectancy. [7,8] At present, materials employed in optical fiber interferometer to form highreflectivity layers, are predominantly metallic films (silver and gold mirrors), polished glass and lacquers. Having satisfactory optical parameters, these materials offer limited chemical resistance, are susceptible to mechanical damage and mostly not biocompatible.…”