Deposition and characterization of titanium carbide thin films by magnetron sputtering using Ti and TiC targets

Djafer, Amina Zouina Ait; Saoula, Nadia; Madaoui, N.; Zerizer, Abdellatif

doi:10.1016/j.apsusc.2014.05.084

Cited by 45 publications

(26 citation statements)

References 37 publications

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“…However, TiC X has a wide stoichiometry from x = 0.47 to 0.98 and since PVD is a non-equilibrium process, the α-Ti lattice may accept more carbon atoms due to hindered mobility of the deposited particles [15].…”

Section: Accepted M Manuscriptmentioning

confidence: 99%

TiC crystallite formation and the role of interfacial energies on the composition during the deposition process of TiC/a:C thin films

Oláh

Fogarassy

Sulyok

et al. 2016

Surface and Coatings Technology

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TiC / amorphous carbon (TiC/a:C) nanocomposite thin films were deposited from two targets by direct current (DC) magnetron sputtering system at room temperaure. The film´s composition and morphology were studied in detail by High Resolution Transmission Electron Microscopy (HRTEM), Selected Area Electron Diffraction (SAED), X-ray Photoelectron Spectroscopy (XPS) and Raman Spectroscopy. The sputtering power of carbon target (P C ) was kept at the constant 150 W, while the sputtering power of titanium target (P Ti ) was changed between 5 W and 150 W. Additionally, a C/Ti multilayer was deposited and characterized for comparison. The growth mechanism was derived from the XPS, Raman and HRTEM observations on the grown layer structures and it was completed by a semi-empirical equation for the dependence on the average atomic fraction of Ti. The HRTEM investigations A C C E P T E D M A N U S C R I P T ACCEPTED MANUSCRIPT2 confirmed that the first nucleating phase is amorphous carbon due to its lowest surface energy among the possible phases. The second nucleating phase within the amorphous carbon matrix is TiC; its growth is kinetically not limited. The increase of Ti content resulted in larger TiC nanocrystallites and thinner amorphous carbon spacing between the TiC phases shown by HRTEM analysis. The characteristic texture of the crystallite structure was observed in the case of 120 W and 150 W of P Ti . All observation confirmed the two main phases; amorphous carbon + carbide phase. The hcp titanium phase was not formed due to nucleation barrier. The average sputtered composition differs from the average deposited composition due to different nucleation barriers of different phases.

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Section: Accepted M Manuscriptmentioning

confidence: 99%

TiC crystallite formation and the role of interfacial energies on the composition during the deposition process of TiC/a:C thin films

Oláh

Fogarassy

Sulyok

et al. 2016

Surface and Coatings Technology

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“…In addition, some pores are deeper up to 10-15 nm in this film as shown in z-scale of the AFM image. Formation of pores is related to oxidation of metallic compounds and radicals which nucleate and form bigger size [18,19]. Therefore, pores are chemically reactive and generally oxidized which is embedded within smaller particles.…”

Section: Afm Analysismentioning

confidence: 99%

Wear resistant multiphase compound of Ti(C, O, N)/a-C:H nano composite film

et al. 2015

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“…The leakage current test of insulators with and without deposition was also performed before and after being subjected to artificial salt spray weathering for alternating current systems with nominal voltages higher than 1000 V [13][14][15][16][17][18][19][20][21][22][23][24][25][26][27][28][29] .…”

Section: Characterization Of the Materialsmentioning

confidence: 99%

“…In cold plasma whose gas is confined in a controlled environment under pressures on the order of 10 -3 Pa, to guarantee greater ionization efficiency for the species, energy sources such as luminescent discharges of direct current and radiofrequency discharges are widely used 22,23 . One of the processes used for the deposition of nanometric films on substrates is sputtering, which promotes the disarrangement and removal of atoms from the surface of the material (target) for deposition on another (substrate) 24 .…”

Section: Introductionmentioning

confidence: 99%

Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use

et al. 2015

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In this study, the cold plasma technique was used to produce nanometric titanium films with hydrophobic and anti-fouling properties. The films where deposited on porcelain electrical insulators surfaces to minimize the effects of leakage current. The magnetron sputtering technique was used with a target of pure titanium sheet, and argon as the ionization gas. The deposited films present an average thickness of 58 to 350 nm. After coating the insulators, the assays performed indicated a greater degree of hydrophobicity and maintenance of leakage current after exposure to salt spray. Lower leakage current values were observed in both natural and saline environments compared with the uncoated device.

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Deposition and characterization of titanium carbide thin films by magnetron sputtering using Ti and TiC targets

Cited by 45 publications

References 37 publications

TiC crystallite formation and the role of interfacial energies on the composition during the deposition process of TiC/a:C thin films

TiC crystallite formation and the role of interfacial energies on the composition during the deposition process of TiC/a:C thin films

Wear resistant multiphase compound of Ti(C, O, N)/a-C:H nano composite film

Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use

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