2000
DOI: 10.1063/1.126387
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Depletion region in thermally poled fused silica

Abstract: Articles you may be interested inThermal poling induced second-order nonlinearity in femtosecond-laser-modified fused silica Appl. Phys. Lett. 93, 061115 (2008); 10.1063/1.2973149 Thermal poling and ultraviolet erasure characteristics of type-III ultraviolet-grade fused silica and application to periodic poling on planar substrates Secondary ion mass spectrometry study of space-charge formation in thermally poled fused silica

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Cited by 39 publications
(12 citation statements)
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“…Our values of nonlinear thickness agree well with those obtained with other methods, such as chemical etching. 4,9,10 The observed nonlinear growth of depth with poling time (Fig. 4) also agrees with that reported previously.…”
supporting
confidence: 91%
“…Our values of nonlinear thickness agree well with those obtained with other methods, such as chemical etching. 4,9,10 The observed nonlinear growth of depth with poling time (Fig. 4) also agrees with that reported previously.…”
supporting
confidence: 91%
“…The sharp decrease in the profile may be due to the presence of a thin charge layer. 9,10 Once L is known the nonlinear coefficient is found by normalizing the collinear SH with respect to that from a reference sample ͑quartz͒ and assuming that the tensorial components of the nonlinearity d 33 and d 31 are related to each other by d 33 ϭ3d 31 . All measurements were made 1 h after poling and then repeated a week later without observing any significant variation in the measured L or d values.…”
mentioning
confidence: 99%
“…The poling setup used is described in ref 15. Kapton films with a thickness of 7.6 µm were used as the dummy capacitor, which was placed between the anode electrode and the glass sample.…”
Section: Methodsmentioning
confidence: 99%