Dependence of the excitonic transition energies and mosaicity on residual strain in ZnO thin films

Ong, H. C.; Zhu, Aimin; Du, Guotong

doi:10.1063/1.1448660

Cited by 185 publications

(79 citation statements)

References 18 publications

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“…The highest value of hardness and modulus were observed at approximately 31 GPa and 250 GPa, respectively. The increased hardness can be attributed to the nitrogen content in the film, highly dances columnar structure and comparatively lower surface roughness observed in the present experiment [40].…”

Section: Effect Of the Substrate Temperaturesupporting

confidence: 44%

“…The particle size under different sputtering conditions was measured and found to be 14.05 nm and 10.83 nm for the film deposited on Si(100). The differences in particle size can be explained by the relationship of the mean free path, λ (cm), with the molecular diameter of the sputtering gas as indicated Equation 1 [40,41]. …”

Section: Effect Of Different Sputtering Gasesmentioning

confidence: 99%

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Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Shah¹

2017

Int. J. Automot. Mech. Eng.

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Chromium Nitride (CrN) thin films are known for their comparatively good mechanical properties. CrN was deposited on Silicon (100) and glass substrates by using DC magnetron sputtering and the influence of the partial nitrogen content and different gaseous environment on their microstructural characteristics were investigated in the present work. The CrN films were characterised with X-Ray Diffraction (XRD), Field Emission Scanning Electron Microscopy (FE-SEM), Atomic Force Microscopy (AFM) and Nanoindentation was used to characterise the structural and mechanical properties of the deposited thin film. The films showed the [200] preferred orientation at lower (at 20%) nitrogen contents while the intensity of the peak [111] increases with the increase in the nitrogen content. The Cr2N (220) peak was identified at a nitrogen content above 30%, but for nitrogen content above 40%, the CrN phase was observed in both films deposited on Si(100) and glass substrates. The preferred orientations of the CrN thin films are strongly influenced by the nitrogen content inside the chamber as observed in the present work. The surface roughness and deposition rate were observed in a reducing trend with the increasing N2 content and temperature from 20.31 to 2.71nm and from 30.16 nm/min to 25.66nm/min, respectively. The hardness and modulus of pure N2 films deposited on the Si substrates were evaluated by nanoindentaion testing and indicated 31 GPa and 250 GPa, respectively.

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Section: Effect Of the Substrate Temperaturesupporting

confidence: 44%

Section: Effect Of Different Sputtering Gasesmentioning

confidence: 99%

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Shah¹

2017

Int. J. Automot. Mech. Eng.

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“…The preferred orientation of particular crystal planes relative to film substrate can be quantitatively evaluated using texture coefficient, T C(hkl), which has been determined from expression [30,31]:…”

Section: Microstructural Characteristicsmentioning

confidence: 99%

“…The strain in ZnO thin films along c-axis perpendicular to substrate surface can be calculated using the following expression [31]:…”

Section: Microstructural Characteristicsmentioning

confidence: 99%

Structural Characteristics and Optical Properties of Thermally Oxidized Zinc Films

Rusu

Luca

2011

Acta Phys. Pol. A

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Zinc oxide (ZnO) thin films (with thickness ranged from 780 nm to 1150 nm) were prepared by thermal oxidation in air (at 600-700 K, for 20-30 min) of vacuum evaporated metallic zinc films. The Zn films were deposited on glass substrates at room temperature. The crystalline structure of ZnO thin film samples was investigated using X-ray diffraction technique. The diffraction patterns revealed that the ZnO thin films were polycrystalline and have a wurtzite (hexagonal) structure. The film crystallites are preferentially oriented with (002) planes parallel to substrate surface. Some important structural parameters (lattice parameters of the hexagonal cell, crystallite size, Zn-O bond length, residual stress, etc.) of the films were determined. The surface morphology of the prepared ZnO thin films, investigated by atomic force microscopy, revealed a uniform columnar structure. The spectral dependence of transmission coefficient has been studied in the wavelength range from 300 nm to 1700 nm. The optical energy band gap calculated from the absorption spectra (supposing allowed direct band-to-band transitions) are in the range 3.17-3.19 eV. The dependence of the microstructural and optical characteristics on the preparation conditions (oxidation temperature, oxidation time, etc.) of the oxidized zinc films is discussed.

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“…The decrease of band gap with the increase of thickness is generally attributed to the increase of crystallite size and decrease in strain and dislocation density [39][40][41]. For our TiO 2 films with different nanorod lengths, the grain size along the [110] direction and the distance between the (220) planes have been calculated.…”

Section: Resultsmentioning

confidence: 99%

Preparation and characterization of dye-sensitized TiO2 nanorod solar cells

Chen

et al. 2015

Thin Solid Films

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TiO 2 nanorods were prepared by DC reactive magnetron sputtering technique and applied to dye-sensitized solar cells (DSSCs). The length of the TiO 2 nanorods was varied from 1 μm to 6 μm. The scanning electron microscopy images show that the nanorods are perpendicular to the substrate. Both the X-ray diffraction patterns and Raman scattering results show that the nanorods have an anatase phase; no other phase has been observed. (101) and the (220) diffraction peaks have been observed for the TiO 2 nanorods. The (101) diffraction peak intensity remained constant despite the increase of nanorod length, while the intensity of the (220) diffraction peak increased almost linearly with the nanorod length. These nanorods were used as the working electrodes in DSSCs and the effect of the nanorod length on the conversion efficiency has been studied. An optimum photoelectric conversion efficiency of 4.8% has been achieved for 4 μm length nanorods.

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Dependence of the excitonic transition energies and mosaicity on residual strain in ZnO thin films

Cited by 185 publications

References 18 publications

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Structural Characteristics and Optical Properties of Thermally Oxidized Zinc Films

Preparation and characterization of dye-sensitized TiO2 nanorod solar cells

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