2010
DOI: 10.1016/j.apsusc.2010.01.083
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Dependence of surface nano-structural modifications of Ti implanted by N+ ions on temperature

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Cited by 13 publications
(10 citation statements)
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“…Vaz et al [5] studied structural, physical and mechanical properties of sub-stoichiometric TiN x thin films. In our earlier work [6] on the nanostructural modification of Ti implanted with N þ ions as a function of substrate temperature we reported on the development of titanium nitride with different compositions in the implanted sample as well as the presence of different titanium compositions such as titanium oxides. As mentioned in [6], although a great amount of literature on TiN exists, to the best of our knowledge, there has been no study on the stoichiometric changes made during the N þ ion implantation of bulk titanium (sheet/foil) samples prior to our work [6].…”
Section: Introductionmentioning
confidence: 98%
“…Vaz et al [5] studied structural, physical and mechanical properties of sub-stoichiometric TiN x thin films. In our earlier work [6] on the nanostructural modification of Ti implanted with N þ ions as a function of substrate temperature we reported on the development of titanium nitride with different compositions in the implanted sample as well as the presence of different titanium compositions such as titanium oxides. As mentioned in [6], although a great amount of literature on TiN exists, to the best of our knowledge, there has been no study on the stoichiometric changes made during the N þ ion implantation of bulk titanium (sheet/foil) samples prior to our work [6].…”
Section: Introductionmentioning
confidence: 98%
“…Figure 1 shows XRD results for the nine different experimental conditions. Two XRD peaks at around 40°-70°are observed, which correspond to the MoS 2 (103) and Ti (103), respectively (Ma et al 2009;Firouzi-Arani et al 2010). Full with at half maximum (FWHM) of the peak is inversely related to the crystal size (Kahraman et al 2005).…”
Section: Characterizationmentioning
confidence: 97%
“…The formation of this layer may not be enough to avoid wear under severe testing conditions. Physical vapor deposition (PVD) techniques such as direct-current (DC) magnetron sputtering, ion plating, and plasma-based ion implantation are employed to deposit TiN thin films [10][11][12].…”
Section: Introductionmentioning
confidence: 99%