Dependence of ion sheath collapse on secondary electron emission in plasma immersion ion implantation

Abstract

Numerical studies of collisionless and collisional sheath evolution in plasma source ion implantations Phys. Plasmas 12, 043501 (2005); 10.1063/1.1861057 Effects of assistant anode on planar inductively coupled magnetized argon plasma in plasma immersion ion implantation J. Appl. Phys. 93, 5883 (2003); 10.1063/1.1568151Effect of secondary electron emission on sheath potential in an electron cyclotron resonance plasmaThe collapse of the ion sheath in front of a dielectric substrate during argon plasma immersion ion implantation is investigated using a Langmuir probe. The probe signals during the buildup and collapse of the ion sheath are recorded from a lime glass substrate with a magnesium metal plate placed on top. The collapsing speed of the ion sheath is shown to strongly depend on the secondary electron emission coefficient of the substrate. The authors' results show that it is possible to derive secondary electron emission coefficients from insulating materials based on the probe signals.

Influence of substrate material on plasma in deposition/sputtering reactor: experiment and computer simulation

“…The secondary electron emission was studied in the context of plasma immersion ion implantation [6][7][8]. For example the one-dimensional fluid sheath model was developed [8] for the description of the charging effects with secondary electron emission during plasma immersion ion implantation with dielectric substrates.…”

Improved hydrogen ionization rate in enhanced glow discharge plasma immersion ion implantation by enlarging the interaction path using an insulating tube

“…It is because of the buildup of the ion sheath near the cathode which causes more ions to be implanted into the substrate. 20 When the electrons accumulate at the exit of the inlet, ionization is effective and the current increases steadily. The current waveforms obtained with the insulating tube are almost the same as those without tube before 10 μs.…”

Surface Structures and Osteoblast Activity on Biomedical Polytetrafluoroethylene Treated by Long‐Pulse, High‐Frequency Oxygen Plasma Immersion Ion Implantation

“…Simulations and experiments showed that the surface potential would be gradually reduced due to surface charging. [23,24] Hence, the full negative surface potential might not be maintained throughout the 200 ms pulsing. Surface charging may be an important factor in the modification efficacy of insulators such as PTFE and more work is needed to investigate this issue.…”