2004
DOI: 10.1016/j.tsf.2003.10.138
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Dependence of carrier concentrations on oxygen pressure for Ga-doped ZnO prepared by ion plating method

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Cited by 72 publications
(35 citation statements)
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“…However, XRD measurements indicate [8] the average grain size in these arc grown films is no larger than 40 nm. From the Hall measurements, the electron mean free path can be estimated [40] and was in the range of 10 to 30 nm for the arc-grown ICO. Thus, its likely that many electrons are crossing the grain boundaries during optical excitation, which will bring the optical mobility closer to the Hall mobility.…”
Section: Discussionmentioning
confidence: 99%
“…However, XRD measurements indicate [8] the average grain size in these arc grown films is no larger than 40 nm. From the Hall measurements, the electron mean free path can be estimated [40] and was in the range of 10 to 30 nm for the arc-grown ICO. Thus, its likely that many electrons are crossing the grain boundaries during optical excitation, which will bring the optical mobility closer to the Hall mobility.…”
Section: Discussionmentioning
confidence: 99%
“…Some experiments [81,82] have shown a variation in conductivity and mobility with P O 2 more indicative of the presence of interstitials or cation vacancies (which have also been shown to be present using positron annihilation spectroscopy) [83][84][85][86][87], but oxygen vacancies have been proposed to explain the intrinsic n-type conductivity [36,78,88] and persistent photoconductivity [37,76], as well as other experimental results [89][90][91][92]. Similar to SnO 2 , computational studies tend to indicate that the oxygen vacancy is deep, with the (2+/0) transition occurring at about 1 eV below the CBM [46][47][48][49][50][51][52][53].…”
Section: Introductionmentioning
confidence: 99%
“…We have reported high quality Ga-doped ZnO films at a high deposition rate (e.g. 170 nm/min) on large area substrate by reactive plasma deposition (RPD) method [6,7]. This method, an ion-plating method using dc arc-discharge plasma, is very attractive for the fabrication of ZnO thin films.…”
Section: Introductionmentioning
confidence: 99%