Density determination of focused-electron-beam-induced deposits with simple cantilever-based method

Utke, Ivo; Friedli, Vinzenz; Michler, Johann; Bret, T.; Multone, X.; Hoffmann, P.

doi:10.1063/1.2158516

Cited by 40 publications

(47 citation statements)

References 16 publications

(13 reference statements)

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The density of tips deposited from tetramethyl ortho-silicate ͑TMOS͒, hfac-Cu-VMTS, and Co 2 CO 8 has been measured for beam currents of 0.1, 1, and 100 nA. 66 It was found that the density of the deposit from TMOS is independent of the beam current used. For deposits from hfac-Cu-VMTS both the density and the metal content increased with increasing beam current.…”

Section: Densitymentioning

confidence: 99%

See 1 more Smart Citation

A critical literature review of focused electron beam induced deposition

Dorp

Hagen

2008

Journal of Applied Physics

483

577

View full text Add to dashboard Cite

An extensive review is given of the results from literature on electron beam induced deposition. Electron beam induced deposition is a complex process, where many and often mutually dependent factors are involved. The process has been studied by many over many years in many different experimental setups, so it is not surprising that there is a great variety of experimental results. To come to a better understanding of the process, it is important to see to which extent the experimental results are consistent with each other and with the existing model. All results from literature were categorized by sorting the data according to the specific parameter that was varied ͑current density, acceleration voltage, scan patterns, etc.͒. Each of these parameters can have an effect on the final deposit properties, such as the physical dimensions, the composition, the morphology, or the conductivity. For each parameter-property combination, the available data are discussed and ͑as far as possible͒ interpreted. By combining models for electron scattering in a solid, two different growth regimes, and electron beam induced heating, the majority of the experimental results were explained qualitatively. This indicates that the physical processes are well understood, although quantitatively speaking the models can still be improved. The review makes clear that several major issues remain. One issue encountered when interpreting results from literature is the lack of data. Often, important parameters ͑such as the local precursor pressure͒ are not reported, which can complicate interpretation of the results. Another issue is the fact that the cross section for electron induced dissociation is unknown. In a number of cases, a correlation between the vertical growth rate and the secondary electron yield was found, which suggests that the secondary electrons dominate the dissociation rather than the primary electrons. Conclusive evidence for this hypothesis has not been found. Finally, there is a limited understanding of the mechanism of electron induced precursor dissociation. In many cases, the deposit composition is not directly dependent on the stoichiometric composition of the precursor and the electron induced decomposition paths can be very different from those expected from calculations or thermal decomposition. The dissociation mechanism is one of the key factors determining the purity of the deposits and a better understanding of this process will help develop electron beam induced deposition into a viable nanofabrication technique.

show abstract

Section: Densitymentioning

confidence: 99%

“…Folch and Servat 64 came to the same conclusion based on experimental data. However, Bret et al, 65 Randolph et al, 40 and Utke et al 66 assumed that the increase in temperature can be as much as 60-80°C for tip depositions. The sharp decrease in growth efficiency for contamination in Fig.…”

Section: Temperaturementioning

confidence: 99%

A critical literature review of focused electron beam induced deposition

Dorp

Hagen

2008

Journal of Applied Physics

483

577

View full text Add to dashboard Cite

show abstract

“…For example, it has been observed that increasing the power density of the incident electron beam and/or decreasing the steady-state concentration of the precursor during deposition results in an increase in deposited metal content although no study to date has produced 100% metallic purity using such a strategy. 10,22,[33][34][35][36][37][38] Substrate annealing during deposition decreases the residence time for both the adsorbed precursors and the volatile products of dissociation, and also effectively increases the purity of deposits formed by FEBIP. [39][40][41] Postdeposition annealing, either in situ or in the presence of a reactive species, can also result in increased deposition purity.…”

Section: A͒mentioning

confidence: 99%

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

Wnuk

Gorham

Rosenberg

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

View full text Add to dashboard Cite

Focused electron beam induced processing ͑FEBIP͒ of volatile organometallic precursors has become an effective and versatile method of fabricating metal-containing nanostructures. However, the electron stimulated decomposition process responsible for the growth of these nanostructures traps much of the organic content from the precursor's ligand architecture, resulting in deposits composed of metal atoms embedded in an organic matrix. To improve the metallic properties of FEBIP structures, the metal content must be improved. Toward this goal, the authors have studied the effect of atomic hydrogen ͑AH͒ and atomic oxygen ͑AO͒ on gold-containing deposits formed from the electron stimulated decomposition of the FEBIP precursor, dimethyl-͑acetylacetonate͒ gold͑III͒, Au III ͑acac͒Me 2 . The effect of AH and AO on nanometer thick gold-containing deposits was probed at room temperature using a combination of x-ray photoelectron spectroscopy ͑XPS͒, scanning Auger electron spectroscopy, and atomic force microscopy ͑AFM͒. XPS revealed that deposits formed by electron irradiation of Au III ͑acac͒Me 2 are only Ϸ10% gold, with Ϸ80% carbon and Ϸ10% oxygen. By exposing deposits to AH, all of the oxygen atoms and the majority of the carbon atoms were removed, ultimately producing a deposit composed of Ϸ75% gold and Ϸ25% carbon. In contrast, all of the carbon could be etched by exposing deposits to AO, although some gold atoms were also oxidized. However, oxygen was rapidly removed from these gold oxide species by subsequent exposure to AH, leaving behind purely metallic gold. AFM analysis revealed that during purification, removal of the organic contaminants was accompanied by a decrease in particle size, consistent with the idea that the radical treatment of the electron beam deposits produced close packed, gold particles. The results suggest that pure metallic structures can be formed by exposing metal-containing FEBIP deposits to a sequence of AO followed by AH.

show abstract

“…The matrix density was assumed ϳ1.5 g cm −3 . 15 An equivalent deposition experiment was performed using the FEB ͑5 kV, 0.8 nA͒ resulting in a deposit density of deposit = ͑4.5± 0.5͒ g cm −3 . A Pt content of 15 at.…”

mentioning

confidence: 99%

Mass sensor for in situ monitoring of focused ion and electron beam induced processes

Friedli

Santschi

Michler

et al. 2007

Applied Physics Letters

View full text Add to dashboard Cite

A cantilever-based mass sensor for in situ monitoring of deposition and milling using focused ion and electron beams is presented. Carefully designed experiments allowed for mass measurements with a noise level of ±10fg by tracking the resonance frequency of a temperature stabilized piezoresistive cantilever using phase locking. The authors report on measurements of precursor surface coverage, residence time, mass deposition rates, yields, and deposit density using the (CH3)3PtCpCH3 precursor.

show abstract

Density determination of focused-electron-beam-induced deposits with simple cantilever-based method

Cited by 40 publications

References 16 publications

A critical literature review of focused electron beam induced deposition

A critical literature review of focused electron beam induced deposition

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

Mass sensor for in situ monitoring of focused ion and electron beam induced processes

Contact Info

Product

Resources

About