2000
DOI: 10.1109/55.863099
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Demonstration of aluminum-free metamorphic InP/In/sub 0.53/Ga/sub 0.47/As/InP double heterojunction bipolar transistors on GaAs substrates

Abstract: We report, for the first time, the successful fabrication of aluminum-free metamorphic (MM) InP/In 0 53 Ga 0 47 As/InP double heterojunction bipolar transistors (DHBTs) on GaAs substrates with a linearly graded In Ga 1 P buffer grown by solid-source molecular beam epitaxy (SSMBE). Device with 5 5 m 2 emitter displays a peak current gain of 40 and a common-emitter breakdown voltage (BV CEO ) higher than 9 V, a current gain cut-off frequency ( ) of 48 GHz and a maximum oscillation frequency ( max ) of 42 GHz. A … Show more

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Cited by 29 publications
(3 citation statements)
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“…All measurements were carried out on a wafer using Cascade Microtech's Air-Coplanar Probes ACP50-GSG-100. Details of the device structure and fabrication technique have been described elsewhere [20,22].…”
Section: Resultsmentioning
confidence: 99%
“…All measurements were carried out on a wafer using Cascade Microtech's Air-Coplanar Probes ACP50-GSG-100. Details of the device structure and fabrication technique have been described elsewhere [20,22].…”
Section: Resultsmentioning
confidence: 99%
“…Once the parasitic elements (PAD capacitances, feedline inductances, and ohmic contact resistances) are known, the extraction of the intrinsic parameters can be carried out using the following procedure. Details of the device structure and fabrication technique for 5×5 μm 2 InP/InGaAs DHBTs have been described elsewhere [17,18].…”
Section: Parameter Extractionmentioning
confidence: 99%
“…To illustrate the above method, we present the extracted model parameters for several 5 Â 5 μm 2 InP/InGaAs DHBTs, whose processing and epitaxial structure have been published in Wang et al (2000). The extracted extrinsic model parameters are summarised in Table 1.…”
Section: Parameter Extraction and Model Verificationmentioning
confidence: 99%