Degradation of an antibiotic via a photo-Fenton process on block copolymer-nanopatterned iron oxide coated substrates

Paiva, Aislan Esmeraldo; Guin, Jhimli Paul; Vasquez, Jhonattan Frank Baez; Thampi, K. Ravindranathan; Sullivan, James A.; Borsagli, Fernanda Guerra Lima Medeiros; Morris, Michael A.

doi:10.1016/j.cej.2023.142925

Cited by 9 publications

(1 citation statement)

References 60 publications

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“…Phase separated P2VP- b -PS films were prepared according to previous studies. , Silicon wafers were cut into 4 cm 2 squares and subjected to ultrasonic cleaning in acetone for 20 min, followed by drying with a stream of N 2 . Solutions of BCP1 (1.5 wt %) and BCP2 (2.0 wt %) were prepared in a 1:4 mixture of toluene and tetrahydrofuran.…”

Section: Experimental Methodsmentioning

confidence: 99%

High Aspect Ratio Nanoscale Pores through BCP-Based Metal Oxide Masks and Advanced Dry Etching

Esmeraldo Paiva,

Gerlt,

Läubli

et al. 2023

ACS Appl. Mater. Interfaces

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The reliable and regular modification of the surface properties of substrates plays a crucial role in material research and the development of functional surfaces. A key aspect of this is the development of the surface pores and topographies. These can confer specific advantages such as high surface area as well as specific functions such as hydrophobic properties. Here, we introduce a combination of nanoscale self-assembled block-copolymer-based metal oxide masks with optimized deep reactive ion etching (DRIE) of silicon to permit the fabrication of porous topographies with aspect ratios of up to 50. Following the evaluation of our procedure and involved parameters using various techniques, such as AFM or SEM, the suitability of our features for applications relying on high light absorption as well as efficient thermal management is explored and discussed in further detail.

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Section: Experimental Methodsmentioning

confidence: 99%