High Aspect Ratio Nanoscale Pores through BCP-Based Metal Oxide Masks and Advanced Dry Etching
Aislan Esmeraldo Paiva,
Michael S. Gerlt,
Nino F. Läubli
et al.
Abstract:The reliable and regular modification of the surface
properties
of substrates plays a crucial role in material research and the development
of functional surfaces. A key aspect of this is the development of
the surface pores and topographies. These can confer specific advantages
such as high surface area as well as specific functions such as hydrophobic
properties. Here, we introduce a combination of nanoscale self-assembled
block-copolymer-based metal oxide masks with optimized deep reactive
ion etching (DRIE… Show more
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