2010
DOI: 10.14723/tmrsj.35.611
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Defect Control of ZnO Nano-particles Fabricated by Pulsed Nd:YAG Laser Ablation

Abstract: ZnO nano-particles with a diameter of 10-20 nm were fabricated under oxygen and helium mixture plasma circumstance by evaporating Zn target using pulsed laser ablation. Cathodoluminescence technique, combined with transmission electron microscopy, X-ray diffraction and energy-dispersive spectrometer, was applied to study luminescence property and crystalline structure of ZnO nano-particles. Varying the oxygen partial pressure from 300 Pa to 1000 Pa, the intensity of UV peak increased and dominated in cathodolu… Show more

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Cited by 2 publications
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“…They have reported that the oxygen plasma treatment affects the chemical bonding state and crystalline structure to help reduce the density of interface states, oxygen vacancies and defects for as-deposited BSTZ thin films and enhance the capacitance of the films. Growing high-quality thin films of various oxide and metal-oxide-based materials, including MO garnets, on various substrates, is typically accomplished by creating oxygen plasma and allowing extra oxygen input with argon (Ar), Nitrogen (N 2 ) or Hydrogen (H) or Helium (He) plasma during the deposition process [ 28 , 29 , 30 , 31 , 32 , 33 , 34 , 35 , 36 , 37 ]. However, to the best of our knowledge, using post-deposition oxygen plasma treatment on as-deposited highly Bi-substituted iron garnet thin films, prior to the annealing crystallization processes, has never been reported, at least not in conjunction with MO quality measurements.…”
Section: Introductionmentioning
confidence: 99%
“…They have reported that the oxygen plasma treatment affects the chemical bonding state and crystalline structure to help reduce the density of interface states, oxygen vacancies and defects for as-deposited BSTZ thin films and enhance the capacitance of the films. Growing high-quality thin films of various oxide and metal-oxide-based materials, including MO garnets, on various substrates, is typically accomplished by creating oxygen plasma and allowing extra oxygen input with argon (Ar), Nitrogen (N 2 ) or Hydrogen (H) or Helium (He) plasma during the deposition process [ 28 , 29 , 30 , 31 , 32 , 33 , 34 , 35 , 36 , 37 ]. However, to the best of our knowledge, using post-deposition oxygen plasma treatment on as-deposited highly Bi-substituted iron garnet thin films, prior to the annealing crystallization processes, has never been reported, at least not in conjunction with MO quality measurements.…”
Section: Introductionmentioning
confidence: 99%
“…They have reported that the oxygen plasma treatment affects the chemical bonding state and crystalline structure help reducing the interface states, oxygen vacancies and defects for as-deposited BSTZ thin films, and enhance the capacitance of the films. Growing high-quality thin films of various oxide and metaloxide materials, including MO garnets, on various substrates, is typically accomplished by creating oxygen plasma and allowing extra oxygen input with argon (Ar), Nitrogen (N2), or Hydrogen (H) or Helium (He) plasma during the deposition process [25][26][27][28][29][30][31][32][33][34]. However, to our knowledge, using postdeposition oxygen plasma treatment on as-deposited highly Bi-substituted iron garnet thin-films, prior to the annealing crystallization processes, has never been reported.…”
Section: Introductionmentioning
confidence: 99%