“…They have reported that the oxygen plasma treatment affects the chemical bonding state and crystalline structure to help reduce the density of interface states, oxygen vacancies and defects for as-deposited BSTZ thin films and enhance the capacitance of the films. Growing high-quality thin films of various oxide and metal-oxide-based materials, including MO garnets, on various substrates, is typically accomplished by creating oxygen plasma and allowing extra oxygen input with argon (Ar), Nitrogen (N 2 ) or Hydrogen (H) or Helium (He) plasma during the deposition process [ 28 , 29 , 30 , 31 , 32 , 33 , 34 , 35 , 36 , 37 ]. However, to the best of our knowledge, using post-deposition oxygen plasma treatment on as-deposited highly Bi-substituted iron garnet thin films, prior to the annealing crystallization processes, has never been reported, at least not in conjunction with MO quality measurements.…”