Deeply-etched micromirror with vertical slit and metallic coating enabling transmission-type optical MEMS filters

Othman, Muhammad A.; Sabry, Yasser M.; Sadek, Mohamed; Nassar, Ismail M.; Khalil, Diaa

doi:10.1117/12.2211323

Cited by 6 publications

(2 citation statements)

References 11 publications

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“…The former is fabricated using deep reactive ion etching (DRIE). 3 A near vertical mirror can be obtained with proper optimization. However, Bosch process usually creates large DRIE scallops due etching and passivation steps cycling.…”

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confidence: 99%

Formation of 45° Silicon (110) Surface Using Triton X-nSurfactants in Potassium Hydroxide for Infrared Applications

Goh¹,

Guo²,

Chuan³

et al. 2018

ECS J. Solid State Sci. Technol.

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Silicon (Si) micromirrors are an integral feature for many micro-optomechanical systems (MOEMS). Such mirrors are generally wet etched in alkaline solution at elevated temperature. For 90 • beam steering applications, 45 • slanted Si (110) plane is the prime choice fabricated with the incorporation of tensioactive surfactants. Here, Triton-Si and Triton-hydroxide (OH − )/H 2 O interaction using varying hydrophilic chain length Triton (X-45, X-100 and X-405) were investigated. The surfactant concentration was varied from 0 to 1000 ppm in potassium hydroxide (KOH). Triton molecules were shown to adsorb preferentially on (110) than on (100) surface. Longer chain length Triton hampered OH − access to Si surface resulting in slower etch rate. In contrast, contact angle measurement suggested that shorter Triton interfaced better with Si surface. Later, Si wafers etched in Triton 10 ppm -KOH were examined. The measured output for (110) X-45 , (110) X-100 , (110) X-405 and polished Si wafer reference (R q < 5Å) mirrors were 0.58, 0.76, 0.72 and 1.25 mW, respectively. Subsequently, Si-SiO 2 thin film in [HLHL] 2 -substrate configuration was fabricated. Broadband micromirror for use in 3.0-5.5 μm spectrum range was experimentally realized with reflected efficiency of 73%.

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mentioning

confidence: 99%

Formation of 45° Silicon (110) Surface Using Triton X-nSurfactants in Potassium Hydroxide for Infrared Applications

Goh¹,

Guo²,

Chuan³

et al. 2018

ECS J. Solid State Sci. Technol.

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show abstract

“…Bulk micromachined on-chip mirrors are an important feature in many MEMS and MOEMS devices [126]. Normally, they can be dry or wet etched, laser ablation, molding and dicing [127][128][129][130][131][132][133]. For dry etched mirror, deep etching using deep reactive ion etching (DRIE) are typically employed for the fabrication of vertical mirror.…”

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confidence: 99%

Low cost miniaturized spectrometer for mid infrared sensing

Goh¹

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Overcoming the near-infra-red spectral range limit with Fabry-Perot silicon microcavity enabled by slotted micromirrors

Erfan

Sabry

Marty

et al. 2017

2017 Conference on Lasers and Electro-Optics Pacific Rim (CLEO-PR)

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Deeply-etched micromirror with vertical slit and metallic coating enabling transmission-type optical MEMS filters

Cited by 6 publications

References 11 publications

Formation of 45° Silicon (110) Surface Using Triton X-nSurfactants in Potassium Hydroxide for Infrared Applications

Formation of 45° Silicon (110) Surface Using Triton X-nSurfactants in Potassium Hydroxide for Infrared Applications

Low cost miniaturized spectrometer for mid infrared sensing

Overcoming the near-infra-red spectral range limit with Fabry-Perot silicon microcavity enabled by slotted micromirrors

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