Deep UV nano-microstructuring of substrates for surface plasmon resonance imaging

Abstract

In this paper, we describe wafer-scale fabrication and characterization of plasmonic chips-containing different sizes and spacings of metallic micro- and nanoline structures-using deep UV lithography. Using a high dose (25 mJ cm( - 2)) and a proper lift-off process, feature sizes as small as 25 nm are obtained. Moreover, we study the dependence of surface plasmon resonance on the angle of incidence and wavelength for different micro- and nanoline size and spacing values, yielding localized to quasi-propagative plasmonic behaviors. Rigorous coupled wave analysis (RCWA) techniques are employed to numerically confirm these experimental observations. Finally, the refractive index of media around the SPRI sensor chips is varied, showing the angulo-spectral regions of higher sensitivity for each type of structure.

RETRACTED: Plasmonic Nanostructures Prepared by Soft UV Nanoimprint Lithography and Their Application in Biological Sensing

“…The patterns were then transferred into the silicon master via suitable reactive ion etching process (RIE), followed by the PMMA mask removal ( Figure 1). The RIE conditions of transfer for Si are: 10 sccm for O 2 , 45 sccm for SF 6 with P = 30 W, a pressure of 50 mTorr and an autopolarization voltage of 85 V. The obtained rates are v Si = 100 nm/min and v PMMA = 76 nm/min [13]. …”

“…Moreover, the charge effect on insulating surface can alter the regularity of the pattern shape, making these techniques unsuitable for a large-scale production. Other lithographic techniques such as extreme UV lithography [6] can also be used, but it is very expensive to fabricate their masks, which makes it difficult to render samples in ample quantity. Among the alternative methods, the soft UV nanoimprint lithography (UV-NIL) has the advantages of high speed of fabricating high-density nanostructures, low cost, and compatibility with biochemical applications [7].…”

Bimodal behavior and isobestic transition pathway in surface plasmon resonance sensing

“…The RCWA calculations carried out in this paper employed an extended Debye model to describe the dispersion relation of relative permittivity of silver and gold [18]. We have previously employed RCWA calculations for studying the plasmonic behavior of gold nano-lines employed for SPRI [19] as well as narrow-grove metallic nano-gratings employed for SPR sensing [20]. In the RCWA calculations carried out for metallic films having different periodically structured domains of molecules, TM polarized plane waves (at different wavelengths and angles of incidence) were incident on the metallic film (having different periodically structured domains of molecules) and the reflectance calculated as a function of the incident angle or wavelength.…”

Fabrication and SERS Performances of Metal/Si and Metal/ZnO Nanosensors: A Review

“…Since the 2000s, surface enhanced Raman scattering (SERS) spectroscopy based on a nanostructured substrate has become a powerful and promising technique for highly sensitive detection of chemical/biological molecules [1][2][3][4]. SERS performance depends on the substrates, which are mainly realized with metallic nanoparticles [5][6][7][8][9] or nanostructures [10][11][12] with different geometries obtained by various techniques such as X-ray interference lithography [13], interference lithography [14,15], deep UV lithography [16,17] and electron beam lithography [18][19][20]. Large SERS enhancement ability and reproducibility are achieved by these techniques.…”