2020
DOI: 10.1002/cplu.202000108
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Cyclic Silylselenides: Convenient Selenium Precursors for Atomic Layer Deposition

Abstract: Three cyclic silylselenides were prepared in a straightforward manner. Property tuning has been achieved by varying the ring size and the number of embedded selenium atoms. All silylselenides possess improved resistance towards moisture and oxidation as well as high thermal robustness and sufficient volatility with almost zero residues. The six‐membered diselenide proved to be particularly superior Se precursors for atomic layer deposition and allowed facile preparation of MoSe2 layers. Their structure and com… Show more

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Cited by 9 publications
(14 citation statements)
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References 31 publications
(55 reference statements)
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“…? nm rough films (≈50-100 nm) -2020 [233] MoCl 5 + Se 2 (SiMe 2 ) 4 300 ? nm rough films (≈20-50 nm) -2020 [233] ReS 2…”
mentioning
confidence: 99%
“…? nm rough films (≈50-100 nm) -2020 [233] MoCl 5 + Se 2 (SiMe 2 ) 4 300 ? nm rough films (≈20-50 nm) -2020 [233] ReS 2…”
mentioning
confidence: 99%
“…Instead, the binding energy of Mo 3d at 228.3 eV corresponding to MoSe 2 was used for this purpose. 25,26 As compared to the XPS results obtained in our previous work from the MoSe 2 deposited using selenides 1 and 3, 15 one must notice relevant differences: (i) the absence of chlorine residues (mainly present by Mo-Cl species) and (ii) the well-dened Se 3d doublet. Those differences suggested the absence of impurities (other chemical species) and complete ligand exchange reaction between selenide 6 and MoCl 5 resulting in a high purity as-deposited ALD MoSe 2 .…”
Section: Preparation Of Mose 2 Akes By Aldmentioning
confidence: 72%
“…17) were reported earlier, see also our recent communication for comprehensive characterization. 15 The general methodology utilizes Li 2 Se, prepared from elemental Se and its reaction with Li or LiBHEt 3 and subsequent reaction with appropriate dichlorosilane (Method A). Compared to formerly prepared 3, the synthesis of asymmetric compound 4 starts from inexpensive silanes and affords higher yield along with more volatile selenide.…”
Section: Synthesismentioning
confidence: 99%
See 1 more Smart Citation
“…In 2019, selenium dimethyldithiocarbamate, which reacts with tris(dimethylamino)antimony to form a Sb 2 Se 3 nanolayer, was introduced by Sarkar et al [9]. We have recently reported on a series of cyclic-silylselenides; in particular, the six-membered derivative bearing two selenium atoms provided very promising results during the depositing of MoSe 2 by ALD [10]. Our further synthetic work [11] has identified bis(trialkylstanyl)selenides, structurally related to bis(trialkylsilyl)selenides, as an ALD selenium precursor with lowered air sensitivity.…”
Section: Introductionmentioning
confidence: 99%