1999
DOI: 10.1149/1.1391965
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Cyclic Electrodeposition of PbS Thin Films

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Cited by 22 publications
(7 citation statements)
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“…PbS nanostructures and thin films have been fabricated using a variety of wet and dry methods including molecular beam epitaxy, spray pyrolysis, electrodeposition, vacuum evaporation, , atomic layer deposition, and chemical bath deposition (CBD). , Chemical bath deposition is an attractive method for the deposition of chalcogenide thin films because it can be employed at low temperatures (≤50 °C) which are compatible with organic substrates, such as polymers and self-assembled monolayers (SAMs), and is inexpensive since the deposition is performed under ambient conditions.…”
Section: Introductionmentioning
confidence: 99%
“…PbS nanostructures and thin films have been fabricated using a variety of wet and dry methods including molecular beam epitaxy, spray pyrolysis, electrodeposition, vacuum evaporation, , atomic layer deposition, and chemical bath deposition (CBD). , Chemical bath deposition is an attractive method for the deposition of chalcogenide thin films because it can be employed at low temperatures (≤50 °C) which are compatible with organic substrates, such as polymers and self-assembled monolayers (SAMs), and is inexpensive since the deposition is performed under ambient conditions.…”
Section: Introductionmentioning
confidence: 99%
“…PbS thin films can be obtained by different deposition techniques such as vacuum evaporation [10], successive ionic layer adsorption and reaction (SILAR) [11], chemical vapor deposition (CVD) [12], electrodeposition (ED) [13][14][15][16], and chemical bath deposition (CBD) [17,18]. Among the above mentioned methods CBD and ED are mostly used as low cost film growth techniques.…”
Section: Introductionmentioning
confidence: 99%
“…To date, extensive researches have been devoted to produce PbS by various deposition processes and methods. Conventionally, chemical bath deposition (CBD) [6], photochemical deposition (PCD) [7], atomic layer epitaxy (ALE) [8], successive ionic layer adsorption and reaction (SILAR) [9] and electrodeposition [10][11][12][13][14] have been utilized to prepare this semiconductor. Electrochemical deposition techniques are attractive methods alternatives to conventional deposition methods because they are inexpensive, operate at ambient temperatures and pressure and provide film thickness control [15].…”
Section: Introductionmentioning
confidence: 99%
“…Electrodeposition of PbS from aqueous solutions has been carried out by constant potential methods, either cathodically [10,11], or anodically [12]. Also, Saloniemi has been prepared PbS by cycling the potential between anodic and cathodic windows using the disodium salt of ethylenediaminetetraacetic acid (EDTA) as a complexing agent for Pb and sodium sulfide (Na 2 S) as a source of sulfide [14].…”
Section: Introductionmentioning
confidence: 99%