1998
DOI: 10.1016/s0167-577x(97)00267-x
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CVD–WC and WCxNy diffusion barrier coatings on WC/Co metalloceramics

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Cited by 10 publications
(5 citation statements)
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“…Important to mention that proper and uniform coating of the substrate is one of the main advantages of HFCVD process. 18 As well, it can be seen in this figure that honeycomb structure was grown on the substrate in the form of separated grains. On the other hand, the grain size of tungsten carbide increased with increasing the temperature of the substrate during the coating process.…”
Section: Methodsmentioning
confidence: 61%
See 1 more Smart Citation
“…Important to mention that proper and uniform coating of the substrate is one of the main advantages of HFCVD process. 18 As well, it can be seen in this figure that honeycomb structure was grown on the substrate in the form of separated grains. On the other hand, the grain size of tungsten carbide increased with increasing the temperature of the substrate during the coating process.…”
Section: Methodsmentioning
confidence: 61%
“…As can be seen in this figure, the surface of the 316L stainless substrate was fully coated by a layer of tungsten carbide. Important to mention that proper and uniform coating of the substrate is one of the main advantages of HFCVD process . As well, it can be seen in this figure that honeycomb structure was grown on the substrate in the form of separated grains.…”
Section: Resultsmentioning
confidence: 84%
“…As can be seen in this figure, the surface of 316L stainless steel sub‐layer is coated thoroughly by a layer of tungsten carbide. Such a good coating characteristic is an advantage of chemical accommodation in the vapor phase that is able to cover the surface uniformly . It can be seen in Figure that by increasing the sub‐layer temperature, the amount of porosities (black points) in the coating has changed.…”
Section: Resultsmentioning
confidence: 97%
“…It looks very likely that WC x N y may exhibit high hardness similar to TiCN, CrCN, and TiSiN systems [4][5][6][7][8]. Up to the present, some optical, electrical, and structural properties have already been reported for the WC x N y films, using different techniques such as physical vapor deposition (PVD) [9], chemical vapor deposition (CVD) [10,11] or atomic layer deposition (ALD) [3,12]. However, so far, there have been very few reports on the mechanical properties for WC x N y films.…”
Section: Introductionmentioning
confidence: 99%