2018
DOI: 10.1109/ted.2018.2866390
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CVD Technology for 2-D Materials

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Cited by 54 publications
(40 citation statements)
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“…In the end, the proposed model overcomes restrictions of both individual methods evaluating just one parameter for layer stacks which do not exhibit a measurable contrast or wavelength shift. In addition, the proposed method is suitable for in situ and ex situ process control of 2D materials and heterostructures deposited via exfoliation, CVD 39 or laser direct writing 40 due to the achievable resolution using objective lenses with high magnification enabling the characterization of micrometer-sized structures. Another conceivable application is the detection of adsorbates on 2D materials by tracking the changes in reflectance.…”
Section: Resultsmentioning
confidence: 99%
“…In the end, the proposed model overcomes restrictions of both individual methods evaluating just one parameter for layer stacks which do not exhibit a measurable contrast or wavelength shift. In addition, the proposed method is suitable for in situ and ex situ process control of 2D materials and heterostructures deposited via exfoliation, CVD 39 or laser direct writing 40 due to the achievable resolution using objective lenses with high magnification enabling the characterization of micrometer-sized structures. Another conceivable application is the detection of adsorbates on 2D materials by tracking the changes in reflectance.…”
Section: Resultsmentioning
confidence: 99%
“…Moreover, the contribution of the precursor to the resulting product is also significant but is generally considered to be secondary. [87,90,103,104] The advantage is that these parameters can be controlled externally, which can lead to controllable growth. Thus, herein, we intend to highlight the effects of various CVD parameters on the synthesis of single-element-and multielement-doped 3D graphene.…”
Section: Cvd Synthesismentioning
confidence: 99%
“…The main idea of this field is to obtain new functionality by joining atomically thin flakes or films of layered materials. For the device technology CVD [ 7 , 8 ], epitaxy [ 9 ], physical vapour transport (PVT) [ 10 ] and electrophoresis [ 11 , 12 , 13 , 14 ] methods of deposition and assembly are preferable. Most of laboratory research on van der Waals heterostructures however rely on deterministical mechanical placement of the flakes.…”
Section: Introductionmentioning
confidence: 99%