Uniform optoelectronic quality of metal halide perovskite
(MHP)
films is critical for scalable production in large-area applications,
such as photovoltaics and displays. While vapor-based MHP film deposition
is advantageous for this purpose, achieving film uniformity can be
challenging due to uneven temperature distribution and precursor concentration
over the substrate. Here, we propose optimized substrate orientations
for the vapor-based fabrication of homogeneous MAPbI3 thin
films, involving a PbI2 primary layer deposition and subsequent
conversion using vaporized methylammonium iodide (MAI). Leveraging
computational fluid dynamics (CFD) simulations, we confirm that vertical
positioning during the PbI2 layer growth yields a uniform
film with a narrow temperature distribution and minimal boundary layer
thickness. However, during the subsequent conversion step, horizontal
substrate positioning results in spatially more uniform MAPbI3 thickness and grain size compared to the vertical placement
due to enhanced MAI intercalation. From this optimized substrate positioning,
we observe substantial optical homogeneity across the substrate on
a centimeter scale, along with uniform and enhanced optoelectronic
device performance within photodetector arrays. Our results offer
a potential path toward the scalable production of highly uniform
perovskite films.