CVD diamond growth from nanodiamond seeds buried under a thin chromium layer

Degutis, Giedrius; Pobedinskas, Paulius; Turner, Stuart; Lu, Ying-Gang; Al-Riyami, Sausan; Ruttens, Bart; Yoshitake, Tsuyoshi; D’Haen, Jan; Haenen, Ken; Verbeeck, Jo; Hardy, An; Bael, Marlies K. Van

doi:10.1016/j.diamond.2016.02.013

Cited by 12 publications

(6 citation statements)

References 30 publications

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“…The top surface microstructure (Figure 4a) is also nanocrystalline in nature, with rounded micron sized granular features present throughout the matrix. There are cracks present in the microstructure, as also found previously by researchers with respect to a sputtered Cr layer [52]. Some of the grains are loosely bound to the bottom layer.…”

Section: Ti Pvd Sputtering and H 2 Plasma-etching Of Ti-mcd Composite...supporting

confidence: 80%

“…Figure 5a shows that there are exposed bottom layer diamond surfaces from place to place, which helped in the nucleation and growth of the next diamond layer. Researchers have previously reported a similar seeding method via a carbon transport phenomenon from the buried layers [52][53][54].…”

Section: Ti Pvd Sputtering and H 2 Plasma-etching Of Ti-mcd Composite...mentioning

confidence: 99%

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Deposition and Characterisation of a Diamond/Ti/Diamond Multilayer Structure

Mallik,

Lloret,

Gutierrez

et al. 2023

Coatings

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In this work, a diamond/Ti/diamond multilayer structure has been fabricated by successively following thin-film CVD and PVD routes. It has been found that a combined pre-treatment of the silicon base substrate, via argon plasma etching for creating surface roughness and, thereafter, detonation nanodiamond (DND) seeding, helps in the nucleation and growth of well-adherent CVD diamond films with a well-defined Raman signal at 1332 cm−1, showing the crystalline nature of the film. Ti sputtering on such a CVD-grown diamond surface leads to an imprinted bead-like microstructure of the titanium film, generated from the underlying diamond layer. The cross-sectional thickness of the titanium layer can be found to vary by as much as 0.5 µm across the length of the surface, which was caused by a subsequent hydrogen plasma etching process step of the composite film conducted after Ti sputtering. The hydrogen plasma etching of the Ti–diamond composite film was found to be essential for smoothening the uneven as-grown texture of the films, which was developed due to the unequal growth of the microcrystalline diamond columns. Such hydrogen plasma surface treatment helped further the nucleation and growth of a nanocrystalline diamond film as the top layer, which was deposited following a similar CVD route to that used in depositing the bottom diamond layer, albeit with different process parameters. For the latter, a hydrogen gas diluted with PH3 precursor recipe produced smaller nanocrystalline diamond crystals for the top layer. The titanium layer in between the two diamond layers possesses a very-fine-grained microstructure. Transmission electron microscopy (TEM) results show evidence of intermixing between the titanium and diamond layers at their respective interfaces. The thin films in the composite multilayer follow the contour of the plasma-etched silicon substrate and are thus useful in producing continuous protective coatings on 3D objects—a requirement for many engineering applications.

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Section: Ti Pvd Sputtering and H 2 Plasma-etching Of Ti-mcd Composite...supporting

confidence: 80%

Section: Ti Pvd Sputtering and H 2 Plasma-etching Of Ti-mcd Composite...mentioning

confidence: 99%

Deposition and Characterisation of a Diamond/Ti/Diamond Multilayer Structure

Mallik,

Lloret,

Gutierrez

et al. 2023

Coatings

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“…O diffusion is also observed, but in a much lower level [ 27 ]. The presence of Cr at the interface region can lead to reactions with the carbon species in the growth plasma, forming chromium carbide [ 16 , 28 , 29 , 30 ], that can suppress the formation of amorphous carbon ( a - C ), inducing the formation of diamond nuclei, and at the same time provide an enhanced bonding to the LNO substrate. The Cr interlayer interacts very well with both the NCD and LNO materials, not only improving the adhesion but also suppressing the diffusion of oxygen into the NCD films, while allowing the Li to diffuse through and be efficiently incorporated into the NCD films.…”

Section: Resultsmentioning

confidence: 99%

“…The Cr-coating was deposited by a home-built DC-pulsed sputtering system using a radio frequency power of 200 W in Ar gas for 10 min. The Cr-coated LNO (Cr/LNO) substrates were then nucleated with a water-based state-of-the-art colloidal suspension of ultradispersed detonation diamond (Nano-Carbon Institute Co., Ltd., Nagano, Japan; zeta potential of (45 ± 5) mV and particle size of 6–7 nm) via drop casting and subsequent spin-drying [ 16 ]. The growth of ~90 nm thick NCD layers, designated as NCD/Cr/LNO films, was performed in a linear antenna microwave plasma enhanced chemical vapor deposition (LA CVD) system using plasma containing 10% methane in hydrogen.…”

Section: Methodsmentioning

confidence: 99%

Low Temperature Synthesis of Lithium-Doped Nanocrystalline Diamond Films with Enhanced Field Electron Emission Properties

et al. 2018

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Low temperature (350 °C) grown conductive nanocrystalline diamond (NCD) films were realized by lithium diffusion from Cr-coated lithium niobate substrates (Cr/LNO). The NCD/Cr/LNO films showed a low resistivity of 0.01 Ω·cm and excellent field electron emission characteristics, viz. a low turn-on field of 2.3 V/µm, a high-current density of 11.0 mA/cm2 (at 4.9 V/m), a large field enhancement factor of 1670, and a life-time stability of 445 min (at 3.0 mA/cm2). The low temperature deposition process combined with the excellent electrical characteristics offers a new prospective for applications based on temperature sensitive materials.

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“…As Bareiß et al [84] and Kellerman et al [86] have shown this phase control is fundamental. A good guide to obtain such control is the work of Degutis et al [88] that verified chromium carbide layer reaction during CVD diamond growth.…”

Section: Chromium Carbidesmentioning

confidence: 99%

Interlayers Applied to CVD Diamond Deposition on Steel Substrate: A Review

et al. 2017

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Academics and industry have sought after combining the exceptional properties of diamonds with the toughness of steel. Since the early 1990s several partial solutions have been found but chemical vapor deposition (CVD) diamond deposition on steel substrate continues to be a persistent problem. The main drawbacks are the high carbon diffusion from gas phase into substrate, the transition metals on the material surface that catalyze sp 2 bond formation, instead of sp 3 bonds, and the high thermal expansion coefficient (TEC) mismatch between diamond and steels. An intermediate layer has been found necessary to increase diamond adhesion. Literature has proposed many efficient intermediate layers as a diffusion barrier for both, carbon and iron, but most intermediate layers shown have not solved TEC mismatch. In this review, we briefly discuss the solutions that exclusively work as diffusion barrier and discuss in a broader way the ones that also solve, or may potentially solve, the TEC mismatch problem. We examine some multilayers, the iron borides, the chromium carbides, and vanadium carbides. We go through the most relevant results of the last two and a half decades, including recent advances in our group. Vanadium carbide looks promising since it has shown excellent diffusion barrier properties, its TEC is intermediary between diamond and steel and, it has been thickened to manage thermal stress relief. We also review a new deposition technique to set up intermediate layers: laser cladding. It is promising because of its versatility in mixing different materials and fusing and/or sintering them on a steel surface. We conclude by remarking on new perspectives.

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CVD diamond growth from nanodiamond seeds buried under a thin chromium layer

Abstract:  Carbon diffusion into the Cr layer during the early CVD diamond growth stages  Carburization and salicidation of the Cr layer in the high-temperature, H-rich plasma

Cited by 12 publications

References 30 publications

Deposition and Characterisation of a Diamond/Ti/Diamond Multilayer Structure

Deposition and Characterisation of a Diamond/Ti/Diamond Multilayer Structure

Low Temperature Synthesis of Lithium-Doped Nanocrystalline Diamond Films with Enhanced Field Electron Emission Properties

Interlayers Applied to CVD Diamond Deposition on Steel Substrate: A Review

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