Curvilinear Mask Process Correction - status quo and outlook

Bork, Ingo; Sharma, Rachit; Zuo, Mary

doi:10.1109/iwaps57146.2022.9972290

Cited by 2 publications

(2 citation statements)

References 7 publications

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“…Note that the upcoming extension of the OASIS standard will also include smooth Bezier and Spline curve data representation in a new MULTIGON record. 8,9 MIA will thus be applicable directly also to such curvilinear data.…”

Section: Mathematical Input Approximationmentioning

confidence: 99%

Efficient exposure of non-Manhattan layouts for optical applications using variable shaped beam lithography

Linn

Fasold

Stolberg

et al. 2023

J. Micro/Nanopattern. Mats. Metro.

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Background: Variable shaped beam systems offer high performance for common Manhattan layouts using rectangular or axis-parallel triangular exposure primitives. Emerging optical applications often consist of numerous non-Manhattan structures. The common processing modes for slanted or curved structures result in high shot counts and thus large write times.Aim: A sophisticated approximation approach for arbitrary non-Manhattan layouts is needed. For repetitive non-Manhattan layouts, the use of cell projection (CP) should be considered. Approach:The JES-approximation of data preparation software ePLACE is introduced and compared to common border approximation. CP in combination with ePLACE's target geometry feature is studied. The different approaches are assessed in optical quality and throughput.Results: Haze measurements of diffractive axicons verify the good optical quality of JES-approximation at moderate write times. Further improvements are enabled by mathematical input approximation (MIA). Scanning electron microscope (SEM) measurements of dot CP arrays validate the functionality of the target geometry approach for fine CD tuning. Write time studies confirm superior throughput results using CP in the exposures.Conclusions: For arbitrary non-Manhattan layouts JES/MIA-approximation should be applied. For repetitive non-Manhattan layouts, CP exposure is the best solution.

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Section: Mathematical Input Approximationmentioning

confidence: 99%

Efficient exposure of non-Manhattan layouts for optical applications using variable shaped beam lithography

Linn

Fasold

Stolberg

et al. 2023

J. Micro/Nanopattern. Mats. Metro.

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show abstract

“…For instance, mask-writers suppliers proposed a curvilinear format support [6]. Moreover, a curvilinear work group was created in 2019 [6] [7] in order to develop an extended Oasis format supporting curves by generalizing the current P39 standard Oasis format [8]. This new format allows the representation of curvilinear shapes by using curve descriptions, with the following supported type of curves: explicit piecewise Bézier, implicit piecewise Bézier, uniform clamped B-Splines, and uniform periodic B-Splines.…”

Section: Introductionmentioning

confidence: 99%

B-spline and Bézier curvilinear representations: a comparative discussion

Venitucci,

Bougron,

Schuch

et al. 2024

Novel Patterning Technologies 2024

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Curvilinear shapes are created by ILT (Inverse Lithography Technology) from design layouts, to compensate lithography process errors. Such shapes are better stored as combination of polygons and curves than merely polygons for efficiency reasons as modeling runtime, mask-writing time, and data volume. This is why a curvilinear format has been proposed by mask-writer suppliers, while its OASIS counterpart has been developed by a curvilinear work group created in 2019. As for their curve parts, these curvilinear formats support: Explicit Bézier, B-Spline, and Implicit Bézier curves. The last two are of particular interest, since they both offer more compaction properties than Explicit Bézier curves, from which they are derived. This paper introduces the different curves as mathematical objects in order to derive their properties, advantages, and disadvantages in terms of compaction and conversion capabilities.

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Curvilinear Mask Process Correction - status quo and outlook

Cited by 2 publications

References 7 publications

Efficient exposure of non-Manhattan layouts for optical applications using variable shaped beam lithography

Efficient exposure of non-Manhattan layouts for optical applications using variable shaped beam lithography

B-spline and Bézier curvilinear representations: a comparative discussion

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