2002
DOI: 10.1134/1.1514805
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Current-voltage characteristic and parameters of the current filament region of an amorphous gallium telluride-crystalline silicon barrier negistor structure

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Cited by 4 publications
(5 citation statements)
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“…In addition to a molecular electronic process, electromigration was considered as a cause for the high currents and reset operations that are analogous to filamentary metal memories. To further investigate this point, the exposed organic material was stripped from a working NanoCell by treating the assembled chip with UV-ozone for 10−30 min. Remarkably, the device behavior of the NanoCell remained and often improved.…”
mentioning
confidence: 99%
“…In addition to a molecular electronic process, electromigration was considered as a cause for the high currents and reset operations that are analogous to filamentary metal memories. To further investigate this point, the exposed organic material was stripped from a working NanoCell by treating the assembled chip with UV-ozone for 10−30 min. Remarkably, the device behavior of the NanoCell remained and often improved.…”
mentioning
confidence: 99%
“…A potential barrier formed in the region where the current filament was formed, which, as the authors of Ref. [16] indicated, persisted upon transition to a low-resistance state.…”
mentioning
confidence: 91%
“…If we turn to earlier papers, where some data on current filamentation in CGSs were obtained and reported on, Refs. [14][15][16] should be referred to. Ref.…”
mentioning
confidence: 99%
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