2007
DOI: 10.1088/0268-1242/22/10/002
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Current–voltage and noise characteristics of reverse-biased Au/n-GaAs Schottky diodes with embedded InAs quantum dots

Abstract: Schottky contacts on n-type GaAs with embedded InAs quantum dots (QDs) were studied by current-voltage (I-V) and low-frequency noise measurements. For comparison, diodes not containing QDs were investigated as reference devices. A wide distribution of the ideality factor was observed, correlated with the level of the leakage current. Reverse I-V characteristics on the logarithmic scale indicate that the space-charge limited current dominates the carrier transport in these diodes. In all diodes, the reverse cur… Show more

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Cited by 4 publications
(8 citation statements)
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“…The leakage current conduction mechanism has been attributed to space charge limited current, correlated to a distribution of trapping centers in the forbidden energy gap of the capping GaAs layer [14]. The experimental data of Fig.…”
Section: Resultsmentioning
confidence: 90%
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“…The leakage current conduction mechanism has been attributed to space charge limited current, correlated to a distribution of trapping centers in the forbidden energy gap of the capping GaAs layer [14]. The experimental data of Fig.…”
Section: Resultsmentioning
confidence: 90%
“…The 1/f noise has been attributed to traps uniformly distributed in energy within the band-gap of the GaAs capping layer [14]. The normalized spectral densities S 1/f /I 2 as a function of the depletion region width W, measured at the frequency of f = 10 Hz are shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…All diodes were from the same wafer. The observed dispersion of the ideality factors is attributed to contact inhomogeneities that confine the diode current to small parts of the contact areas, resulting in an effective Schottky contact area which varies from diode to diode [7]. The experimental data of Fig.…”
Section: Resultsmentioning
confidence: 90%
“…After the formation of QDs, a 10nm thick capping layer of undoped GaAs was deposited by MBE, followed by an upper GaAs layer of thickness 0.4 µm with electron concentration 2×10 16 cm -3 . Details on the growth procedures are presented elsewhere [7]. After the growth, rapid thermal annealing was performed at 700 o C The trap properties of Au/n-GaAs Schottky diodes with embedded InAs quantum dots (QDs) and different ideality factors were studied by capacitance-voltage (C-V) and lowfrequency noise (LFN) measurements in the reverse bias regime.…”
Section: Methodsmentioning
confidence: 99%
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