2005
DOI: 10.1016/j.mee.2005.04.084
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Current status and challenges of ferroelectric memory devices

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Cited by 156 publications
(76 citation statements)
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“…Unfortunately up to now nothing is known about superparaelectric phase in ferroelectric nanoparticles, also the term "superparaelectric" was used for description of bulk ferroelectric relaxors. 5 , 6 There were the attempts to apply the term to ferroelectric film 7 and to the ferroelectric nanoparticles. 8 However the observed properties were characteristic mainly to paraelectric phase rather than to superparaelectric one.…”
Section: Introductionmentioning
confidence: 99%
“…Unfortunately up to now nothing is known about superparaelectric phase in ferroelectric nanoparticles, also the term "superparaelectric" was used for description of bulk ferroelectric relaxors. 5 , 6 There were the attempts to apply the term to ferroelectric film 7 and to the ferroelectric nanoparticles. 8 However the observed properties were characteristic mainly to paraelectric phase rather than to superparaelectric one.…”
Section: Introductionmentioning
confidence: 99%
“…The figure 1 shows a schematic drawing of the FeRAM structure [14]. The unit cell was formed by one transistor and one ferroelectric capacitor which were connected in parallel, during the operation, one capacitor was selected randomly by cutting off it's pare transistor.…”
Section: Feram 'S Structurementioning
confidence: 99%
“…A further increase of the reliability and a decrease of the necessary processing temperatures, which are of particular importance for the integration of functional ferroelectrics into the Si-CMOS technology are superior aims [4,24]. Thus a detailed understanding of the microscopic chemical processes on the pathway from the initial precursor solution to the crystalline film is mandatory.…”
Section: While Metal-organic Chemical Vapor Deposition (Mocvd) Is a Kmentioning
confidence: 99%