1970
DOI: 10.1016/0038-1101(70)90184-x
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Current oscillations in Zn-doped Si p-i-n diodes

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1971
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Cited by 13 publications
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“…The electron mobility of SOI is 1000 cm 2 /Vs, which is very high compared to that of other forms of Si. Furthermore, SOI electronic devices possess superior characteristics, and the leakage current is considerably reduced, to below 1/100 that of conventional poly Si thin-film transistors (TFTs) [3][4][5][6].…”
Section: Introductionmentioning
confidence: 99%
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“…The electron mobility of SOI is 1000 cm 2 /Vs, which is very high compared to that of other forms of Si. Furthermore, SOI electronic devices possess superior characteristics, and the leakage current is considerably reduced, to below 1/100 that of conventional poly Si thin-film transistors (TFTs) [3][4][5][6].…”
Section: Introductionmentioning
confidence: 99%
“…Amorphous-Si TFTs (a-Si:H TFTs) and poly-Si TFTs (p-Si TFTs) have been widely studied. The a-Si:H TFT has serious problems, such as low electron mobility (0.55 cm 2 /Vs), while the p-Si TFT has a serious problem of current nonuniformity caused by the different grain boundaries in adjacent devices [3][4][5][6]. These problems can be solved by using single-crystal-Si, which offers higher electron mobility.…”
Section: Introductionmentioning
confidence: 99%