Abstract:Cubic boron nitride (c-BN) thin films are synthesized by reactive sputtering. Pure boron is used as the sputtering target, which is dc-biassed in an Ar/N 2 electron cyclotron resonance plasma. Substrates are rf-biased with a frequency of 13.56 MHz. BN films with a dominant cubic phase are obtained in the case of a high ion-to-boron flux ratio of 12 at the substrate self-bias higher than −175 V; the transferred momentum per atom is about 1260 (eV amu) 1/2 , which is larger than the value predicted using the mom… Show more
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