Crystallography characteristics of tetragonal nano-zirconia films under various oxygen partial pressure

Eftekhari, Leila; Raoufi, Davood

doi:10.1080/02670844.2018.1555913

Cited by 4 publications

(4 citation statements)

References 36 publications

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“…There are two values (0.8 and 1.6 nm/s for 600 °C) shifted from the dependence due to the effect of deposition rate. Obtained values of surface roughness are similar to other authors' results [44][45][46]. The deposition rate affects the growth of ScAlSZ thin films, also (Figure 3).…”

Section: Resultssupporting

confidence: 90%

Investigation of Morphology of Aluminum Co-Doped Scandium Stabilized Zirconia (ScAlSZ) Thin Films

et al. 2021

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The morphology of aluminum co-doped scandium stabilized zirconia (ScAlSZ) thin films formed by e-beam deposition system was investigated experimentally and theoretically. The dependencies of surface roughness, and the films’ structure on deposition temperature and deposition rate were analyzed. It was shown experimentally that the dependence of the surface roughness on deposition temperature and deposition rate was not monotonic. Those dependencies were analyzed by mathematical modeling. The mathematical model includes the processes of phase separation, adsorption and diffusion process due to the film surface curvature. The impacts of substrate temperature, growth rate on surface roughness of thin films and lateral nanoparticle sizes are shown by the modeling results. Modeling showed that the roughness of the surface of grown films became higher in most cases as the substrate’s temperature rose, but the higher deposition rate resulted in lower surface roughness in most cases. The results obtained by simulations were compared to the relevant experimental data. The non-linear relationships between surface roughness of grown films and lateral size of nanoparticles were also shown by our modeling results, which suggested that the variation in the surface roughness depending on the substrate temperature and growth rate was related to the lateral size of nanoparticles.

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Section: Resultssupporting

confidence: 90%

Investigation of Morphology of Aluminum Co-Doped Scandium Stabilized Zirconia (ScAlSZ) Thin Films

et al. 2021

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“…It is seen symmetric height distribution in the case of annealed at 500 • C because the skewness has a value close to zero. The kurtosis (S ku ) value of all samples is less than 3, which points to the presence of few peaks or valleys [34].…”

Section: Resultsmentioning

confidence: 95%

Power spectral density-based fractal analyses of sputtered yttria-stabilized zirconia thin films

Eftekhari¹,

Raoufi²,

Eshraghi³

et al. 2022

Semicond. Sci. Technol.

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This study provides information about the surface morphology of sputtered yttria-stabilized zirconia (YSZ) thin films from the AFM spectral analysis using the power values of the power spectral density (PSD) function at varying annealing temperatures. We obtained information about fractal features of films such as fractal dimension, correlation length, and surface roughness by interpreting fractal and K-correlation models. The PSDs of the films exhibit an inverse power-law variation at high spatial frequency, which points to the existence of the fractal components in the film’s surface. The annealing temperatures up to 900 °C resulted in a decrease in fractal dimension from 2.60 to 2. The surface roughness increased from 0.10-13.92 nm (obtained from the root mean square) and from 0.04 to 3.95 nm (obtained from the K-correlation model). The films annealed from 500 to 800 °C show fine grain size morphology with Hurst exponent values from 0.40 to 0.53, indicating a homogeneous spatial roughness distribution. While the film annealed at 900 °C has large aggregate grains morphology, suggesting the inhomogeneous spatial distribution of roughness. In contrast, normal self-affine behaviour is observed at lower annealing temperatures. The growth of a sample annealed at the temperature of 900 °C is more likely to be ruled by the step-edge barrier-induced mound growth and inhomogeneous spatial distribution of roughness.

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“…The values of the lattice parameters a and c were found to be increases up to 4 wt-% Mg doping and then it decreases for 6 wt-% MZO. Such an irregular variation in a and c values may be attributed to the uneven variation of the cell structure of the films due to the substitution of Zn 2+ ions by Mg 2+ ions [26,27].…”

Section: Resultsmentioning

confidence: 99%

Enhanced photocatalytic activity of Mg-doped ZnO thin films prepared by sol–gel method

Islam

Azam

2020

Surface Engineering

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Undoped ZnO and Mg-doped ZnO (MZO) thin films were synthesized by sol-gel dip-coating technique. The effect of Mg dopant on the structural, surface-morphological, and optical properties together with the photocatalytic activities of the films was studied. Morphological study shows that incorporation of Mg increases the porosity of the films. Structural investigation reveals that Mg doping declines the crystallinity of the films. The optical analysis demonstrates that the Urbach energy of the films increases due to Mg doping, suggesting the formation of localized energy states. Photocatalytic activities of the films were evaluated by studying the degradation of methylene blue under the ultraviolet light irradiation. MZO demonstrates better photocatalytic efficiency compared to ZnO films. The enhanced photocatalytic efficiency of MZO can be attributed to the charge trapping by localized states, and porosity-induced surface area enhancement due to Mg doping.

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Crystallography characteristics of tetragonal nano-zirconia films under various oxygen partial pressure

Cited by 4 publications

References 36 publications

Investigation of Morphology of Aluminum Co-Doped Scandium Stabilized Zirconia (ScAlSZ) Thin Films

Investigation of Morphology of Aluminum Co-Doped Scandium Stabilized Zirconia (ScAlSZ) Thin Films

Power spectral density-based fractal analyses of sputtered yttria-stabilized zirconia thin films

Enhanced photocatalytic activity of Mg-doped ZnO thin films prepared by sol–gel method

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