1972
DOI: 10.1016/0022-3093(72)90114-7
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Crystallization processes in a-Ge thin films

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Cited by 102 publications
(19 citation statements)
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“…Ge‐rich ZrO 2 films (GeZrO x ) were deposited by MS and Ge ion implantation . Thin ZrO 2 films crystallize at higher temperatures than thin films of Ge . One would therefore expect that the formation of Ge nanocrystals within an amorphous matrix is possible.…”
Section: Influence Of Different Matrix Materialsmentioning
confidence: 99%
See 1 more Smart Citation
“…Ge‐rich ZrO 2 films (GeZrO x ) were deposited by MS and Ge ion implantation . Thin ZrO 2 films crystallize at higher temperatures than thin films of Ge . One would therefore expect that the formation of Ge nanocrystals within an amorphous matrix is possible.…”
Section: Influence Of Different Matrix Materialsmentioning
confidence: 99%
“…[157] Thin ZrO 2 films [158][159][160] crystallize at higher temperatures than thin films of Ge. [161][162][163][164] One would therefore expect that the formation of Ge nanocrystals within an amorphous matrix is possible. However, in the case of GeZrO x layers, Ge and ZrO 2 crystallize simultaneous at 650 C. [151,152] In order to increase the crystallization temperature of the matrix, the ZrO 2 was doped with tantalum.…”
Section: Zirconium Oxide and Zirconium-tantalum Oxidementioning
confidence: 99%
“…Recent investi gations have shown that amor phous Ge crystallizes in the range 300-400°C , and the re ported activation energies range from 1.4 eV -3. 5 eV (Barna , Barna and Pocza , 1972;Germain , Sque lard , Bour goin and Gheorghiu, 1975 ;Chik and Lim , 1975). Sinc e specimen c ontamination in evaporated samples has a str ong effect on the crystallization temperatur e and kinetics , special attention should be paid to results obtained from regrowth in amorphous Ge and Si la yer s produced by ion implantation of single crystals , since this technique produces very clean samples.…”
Section: Ntroductionmentioning
confidence: 99%
“…Here, this transition shown also in Figure 2g occurs at 295 °C. The highest amorphous‐to‐crystalline phase transition temperature within the GST system is given by pure Ge films with T c above 380 °C 43…”
Section: Resultsmentioning
confidence: 99%