2022
DOI: 10.1016/j.matchemphys.2022.125965
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Crystallization of TiO2 on sputter deposited amorphous titanium thin films

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Cited by 11 publications
(3 citation statements)
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“…In this paper, the structural morphology, physical characteristics, and electrochemical attributes obtained from three representative ALD recipes, i.e., R1 (100 ms TiCl 4 + 2 s purge +50 ms H 2 O + 2 s purge), R2 (150 ms TiCl 4 + 2 s purge +50 ms H 2 O + 2 s purge), and R3 (150 ms TiCl 4 + 2 s purge +25 ms H 2 O + 2 s purge) are reported. The ALD TiO x deposition temperature was chosen to be 120 °C, as it was previously noted that ALD temperatures in excess of 150 °C induced crystallization of the TiO x films, with enhanced possibility of corrosion in acidic conditions, , as was also confirmed by preliminary experimentssee Section S3 of the Supporting Information. A TiO x deposition rate of ∼0.02–0.04 nm cycle –1 was recorded by ellipsometry (J.A.…”
Section: Methodsmentioning
confidence: 99%
“…In this paper, the structural morphology, physical characteristics, and electrochemical attributes obtained from three representative ALD recipes, i.e., R1 (100 ms TiCl 4 + 2 s purge +50 ms H 2 O + 2 s purge), R2 (150 ms TiCl 4 + 2 s purge +50 ms H 2 O + 2 s purge), and R3 (150 ms TiCl 4 + 2 s purge +25 ms H 2 O + 2 s purge) are reported. The ALD TiO x deposition temperature was chosen to be 120 °C, as it was previously noted that ALD temperatures in excess of 150 °C induced crystallization of the TiO x films, with enhanced possibility of corrosion in acidic conditions, , as was also confirmed by preliminary experimentssee Section S3 of the Supporting Information. A TiO x deposition rate of ∼0.02–0.04 nm cycle –1 was recorded by ellipsometry (J.A.…”
Section: Methodsmentioning
confidence: 99%
“…De acordo com a Figura 5, podemos notar que também foi identificado apenas o titânio metálico alfa (ICSD 00-044-1294), porém como podemos observar na Tabela 3, tiveram mudanças nas Largura Total Na Metade Do Máximo (FWHM) em relação ao titânio puro, isto indica que pode haver o óxido de titânio na fase amorfa, visto que durante o crescimento do TiO 2 e cristalização, a fase rutilo e anatase foram formadas de estruturas cristalinas em uma matriz amorfa [22].…”
Section: Análise Cristalográfica Pelo Drxunclassified
“…Ti is an extremely active element with a low standard electrode potential (-1.63 V vs NHE for oxidation of Ti to Ti 2+ ). Due to this activity, Ti metal immediately reacts with water molecules in aqueous environments, forming a very thin Ti dioxide (TiO2) film which exhibits excellent corrosion resistance and passivation ability [22,23]. The anti-corrosion performance of TiO2 film inspires researchers to use Nano-Ti particles as additives in epoxy coatings with the aim to significantly improve the corrosion resistance of the coatings.…”
Section: Introductionmentioning
confidence: 99%