Crystallinity and photocatalytic activity of TiO2 films deposited by reactive sputtering with radio frequency substrate bias

Song, Pung Keun; Irie, Yukiko; Shigesato, Yuzo

doi:10.1016/j.tsf.2005.08.249

Cited by 61 publications

(37 citation statements)

References 19 publications

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“…Titanium dioxide (TiO 2 ) is not only a photocatalyst capable of oxidizing various pollutants, but also non-toxic, chemically stable, inexpensive, and commercially available. [1][2][3][4] It's common to use TiO 2 suspension of nanoparticles in the photocatalytic decolorization systems now. [5][6][7] But costly separation procedures are required to recover the TiO 2 powders from the treated effluent prior to discharge in commercial applications.…”

Section: Introductionmentioning

confidence: 99%

Preparation and Photocatalytic Property of TiO<SUB>2</SUB> Columnar Nanostructure Films

Xing

Zhang

et al. 2011

Mater. Trans.

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The rutile TiO 2 films with columnar nanostructure were prepared by combining the glancing angle deposition (GLAD) technique in magnetron sputtering system with the subsequent two-step annealing treatment. Experimental results showed that all the TiO 2 films kept discrete columnar structures as the Ti films deposited by GLAD and accomplished the phase transition from Ti to rutile TiO 2 . Such TiO 2 films performed photocatalytic activity effectively and reusably towards methyl orange under UV light irradiation, which demonstrates the potential applications in wastewater treatment.

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Section: Introductionmentioning

confidence: 99%

Preparation and Photocatalytic Property of TiO<SUB>2</SUB> Columnar Nanostructure Films

Xing

Zhang

et al. 2011

Mater. Trans.

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“…The relationship between the surface electronic structure measured using the conventional PYSA and the photocatalytic activity have been reported by Yamagishi et al, 7 Song et al, 8 Miyamura et al, 9 and Fukumoto et al 10 On the other hand, the high wettability of the TiO2 surface has been extensively studied, [11][12][13][14][15][16][17] and has attracted considerable attention. Therefore, a newly designed PYSA was applied in order to evaluate the change in the TiO2 surface depending upon the humidity.…”

Section: Introductionmentioning

confidence: 89%

In situ Measurements of the Desorption of Water from a TiO2 Surface under Dry Air by Collecting the Photoemission Yield with an Open Counter

2014

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We investigated the desorption of water from a TiO2 surface under a dry atmosphere by collecting the photoemission yield spectra with an open counter. For this purpose, a new attachment for the photoemission yield measurement was prepared. This apparatus is capable of detecting, in the open air, low-energy electrons excited by photons under dried atmospheres; the dew point is below -35 C. A significant change in the photoemission yield spectra due to exposure to a dry atmosphere was observed. To gain a better understanding of these results, observations of the change in the photoemission yield spectra caused by the thermal desorption of adsorbed water were also carried out. The results are consistent with those obtained by exposure to a dry atmosphere. Based on the relationship between the photoemission yield and the thickness of the water layer, the time dependence of the change in the thickness was explained by the second-order reaction rate equation.

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“…On the other hand, when V bias > −100 V occurs the formation of a single rutile phase, however with lower intensity compared with the anatase phase. It is known of the literature [12] that the rutile phase needs more energy for its formation. This fact can be observed in the Fig.…”

Section: Methodsmentioning

confidence: 99%

Influence of process parameters on the growth of pure-phase anatase and rutile TiO2 thin films deposited by low temperature reactive magnetron sputtering

et al. 2010

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In this work is investigated the optimal conditions for deposition of pure-phase anatase and rutile thin films prepared at low temperatures (less than 150 0 C) by reactive dc magnetron sputtering onto well-cleaned p-type Si substrates. For this, the variation of deposition plasma parameters as substrate-to-target distance, total gas pressure, oxygen concentration, and substrate bias were studied and correlated with the characteristics of the deposited films. The XRD analysis indicates the formation of pure rutile phase when the substrate is biased at voltages between −200 and −300 V. Pure anatase phase is only attained when the total pressure is higher than 0.7 Pa. Moreover, it's noticeable a strong dependence of surface roughness with parameters studied.

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Crystallinity and photocatalytic activity of TiO2 films deposited by reactive sputtering with radio frequency substrate bias

Cited by 61 publications

References 19 publications

Preparation and Photocatalytic Property of TiO<SUB>2</SUB> Columnar Nanostructure Films

Preparation and Photocatalytic Property of TiO<SUB>2</SUB> Columnar Nanostructure Films

In situ Measurements of the Desorption of Water from a TiO2 Surface under Dry Air by Collecting the Photoemission Yield with an Open Counter

Influence of process parameters on the growth of pure-phase anatase and rutile TiO2 thin films deposited by low temperature reactive magnetron sputtering

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