2008
DOI: 10.1143/jjap.47.8909
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Crystalline Structure of Highly Piezoelectric (K,Na)NbO3 Films Deposited by RF Magnetron Sputtering

Abstract: We have previously reported (K,Na)NbO 3 (KNN) films, whose piezoelectric properties are the highest reported thus far. In this study, we investigate the detailed crystalline structures of these KNN films after deposition on Pt/MgO and Pt/Ti/SiO 2 / Si substrates by RF magnetron sputtering. The KNN film on Pt/MgO was epitaxially grown on the Pt lower electrode with a perfect h001i orientation in the perovskite structure. The KNN film on Pt/Ti/SiO 2 /Si was polycrystalline with a preferential h001i orientation i… Show more

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Cited by 27 publications
(23 citation statements)
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“…In this study, to alleviate the tensile thermal stress loaded to the film from the substrate and to obtain c -axis oriented NBT–BT thin film on Si, we precisely controlled the sputtering conditions. Sputtered films are commonly under compression due to energetic particle bombardment 5456 , the degree of which is controllable by tailoring the sputtering conditions such as gas pressure, supplied power, and substrate bias 54,55,57,58 . Poling process was not carried out for the obtained film.…”
Section: Methodsmentioning
confidence: 99%
“…In this study, to alleviate the tensile thermal stress loaded to the film from the substrate and to obtain c -axis oriented NBT–BT thin film on Si, we precisely controlled the sputtering conditions. Sputtered films are commonly under compression due to energetic particle bombardment 5456 , the degree of which is controllable by tailoring the sputtering conditions such as gas pressure, supplied power, and substrate bias 54,55,57,58 . Poling process was not carried out for the obtained film.…”
Section: Methodsmentioning
confidence: 99%
“…2͑b͒, which is undoubtedly a contributing parameter for the enhanced dielectric behavior. 14 The P-E curves of the KNN thin film and bulk ceramic are shown in Figs. 3͑a͒ and 3͑b͒.…”
mentioning
confidence: 99%
“…Radio-frequency (RF) magnetron sputtering onto Pt 0.8 Ir 0.2 substrate is shown to provide single phase perovskite films with about 30% deficiency of the alkali metal elements [106]. Processing under reduced pressure and temperature suggested that the deficiency is not a consequence of volatilization due to heat treatment but as a result of different sputtering rates.…”
Section: Rf Magnetron Sputteringmentioning
confidence: 99%