Crystal Structure and Photocatalytic Activity of TiO₂Films Deposited by Reactive Sputtering Using Ne, Ar, Kr, or Xe Gases

Crystallinity and photocatalytic activity of TiO2 films deposited by reactive sputtering with radio frequency substrate bias

“…It was confirmed that the content of rutile phase markedly decreased and anatase content increased with increasing atomic mass of the sputtering gas where the crystallinity of anatase phase was much higher than that of rutile phase [10]. Furthermore, crystallinity and photocatalytic activity of TiO 2 films showed a clear tendency to decrease with the decrease in the magnetic field strength during the deposition [11].…”

“…The kinetic energy of sputtered Ti atoms could enhance the surface migration of Ti atoms on the film surface, whereas the bombardment of the high-energy particles should make damages and degrade the film crystallinity. We reported that the content of rutile phase markedly decreased and anatase content increased with increasing atomic mass of the sputtering inert gases where the crystallinity of anatase was much higher than that of rutile phase [10]. The TiO 2 rutile films deposited using Ne gas showed the much broader XRD peak with smaller intensity than those of the TiO 2 anatase films deposited using Xe gas.…”

“…We have reported that crystal structure and photocatalytic activity of TiO 2 films deposited by reactive sputtering using various sputtering inert gases [10] or applying various magnetic field strengths or shapes at the magnetron cathode [11]. It was confirmed that the content of rutile phase markedly decreased and anatase content increased with increasing atomic mass of the sputtering gas where the crystallinity of anatase phase was much higher than that of rutile phase [10].…”

Preparation of TiO2 Thin Film Photocatalyst by High-rate Low-temperature Sputtering Method

“…From a practical perspective, in order to form a TiO 2ˆl m as a photocatalyst on a substrate such as glass, Sol-Gel 4) or vacuum evaporation 5) methods are currently used. More recently, sputtering has received particular attention for this application [6][7][8][9][10][11][12] . An advantage of this method over other methods is that it is eŠec-tive for forming high-quality thinˆlms uniformly over large areas with control of the microstructure to some extent on an atomic level.…”

NANOSTRUCTURE OF TiO2 THIN FILMS PREPARED BY UNBALANCED MAGNETRON SPUTTERING

“…1,2 In recent years, titanium dioxide has attracted a great deal of interest due to its photocatalytic and photoinduced self-cleaning properties. [3][4][5] In general, TiO 2 exists in three different phases: anatase, rutile and brookite. Anatase and brookite are stable at low temperature and will transform into rutile at the temperature above 900 • C. [6][7][8] It is well-known that anatase phase is suitable for photocatalytic and superhydrophilic properties while rutile phase is used for optical applications.…”