Crystal Structure and Magnetoresistance of Fe₁₀Ni₉₀ Films Deposited by Sputter-Beam Method

Abstract

Films of Fe10Ni90 alloy were deposited by the sputter-beam method and their magnetic properties were compared with those of films deposited by a conventional RF sputtering method. High magnetoresistance was obtained for film thickness between 550∼2250 Å. Some of the films exhibit magnetoresistance equal to the bulk value. These properties are attributed to a more enhanced crystal growth than in the RF method.