Creating stable interfaces between reactive materials: titanium nitride protects photoabsorber–catalyst interface in water-splitting photocathodes

Abstract

Thin-films of cubic-NiP2 and TiN layers are applied on Si for efficient and stable photocathodes.

Spontaneous Formation of >90% Optically Transmissive, Electrochemically Active CoP Films for Photoelectrochemical Hydrogen Evolution

“…Comparable values for − J sc have been reported for planar Si(100) surfaces coated with 5–7 nm of crystalline CoP, 3.6 nm of MoS 2 , or 40–50 nm of MoS x Cl y . Stable photocurrents at negative potentials have been obtained for >100 h for devices which use MoS 2 and NiP 2 as catalysts, although such devices produced a current density of −10 mA cm –2 at more negative potentials than devices utilizing CoP because of increased overpotentials required to drive the HER at these catalysts. , Electrodepositions of alloys containing Ni/NiP x or Mo/MoS x could hence be used to prepare transparent metal films that exhibit improved stability. Furthermore, the increased catalyst area obtained for thick, nanostructured films could reduce the overpotential required to drive hydrogen evolution relative to thin, planar films.…”

Comparative Study of Physicochemical Properties and Biocompatibility (L929 and MG63 Cells) of TiN Coatings Obtained by Plasma Nitriding and Thin Film Deposition

“…However, for HCPN, the thickness is not accurate if estimated by RBS, because of nitrogen being several micrometers in depth and, as a light element, it is accompanied by a large energy loss that influences the calculation, with the signal being superimposed by heavier elements in the substrate . The default alternative technique used for measuring nitrided layers is through the use of scanning electron microscopy (SEM), through cross sectional imaging of samples, as seen in section The calculated thickness of the TDF sample was around 160 nm, using the technique described in the literature and its respective experimental and simulated curves can be seen in Figure a.…”

“…The SIMNRA simulated spectra are resolved from an experimental setup (incident ion beam, detection and calibration of the system) and target (surface This method is based on the methodology seen in Hwang (2019). 36 2.10. Biological Assays.…”

“…As simulated RBS data provides thickness information as the number of atoms per unit area, we use the atomic density of each material. The thickness for thin film coating was estimated by the following formula: Where atomic density is This method is based on the methodology seen in Hwang (2019) …”

“…75 The default alternative technique used for measuring nitrided layers is through the use of scanning electron microscopy (SEM), through cross sectional imaging of samples, as seen in section 3. 4 The calculated thickness of the TDF sample was around 160 nm, using the technique described in the literature 36 and its respective experimental and simulated curves can be seen in Figure 7a.…”