Cost-effective mid-infrared micropolarizer fabricated on common silicon by soft nanoimprint lithography

Zeng, Xiangwei; Chu, Jinkui; Kang, Weidong; Wu, Qinming; Zhan, Ran

doi:10.1364/ao.58.004139

Cited by 2 publications

(1 citation statement)

References 16 publications

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“…Several other methods, including nonlinear laser‐induced dry etching, [ 130–132 ] nonlinear laser lithography, [ 133,134 ] nanoimprint lithography, [ 135–137 ] glancing angle deposition, [ 31,32 ] photo‐polymer nano‐printing, [ 138 ] and many others, that are suitable for microstructure fabrication were not reviewed in this paper. The reason is that these methods are not as well and broadly discussed in the scientific community, and there is no confirmed information about their application in ARM fabrication in the mid‐IR range.…”

Section: Discussionmentioning

confidence: 99%

Review of Surface Modification Technologies for Mid‐Infrared Antireflection Microstructures Fabrication

Bushunov

Tarabrin

Lazarev

2021

Laser & Photonics Reviews

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Mid‐infrared materials antireflection is in high demand for high‐powered or ultra‐broadband coherent light sources, where conventional antireflection coatings cannot be reliably applied. This work provides a critical review of the recent advances in microstructure fabrication technology for mid‐infrared antireflection applications. Several techniques are reviewed, including direct imprinting, wet and reactive ion etching using conventional photoresist masking, novel colloid crystal masks, and maskless etching, laser‐induced periodic structure formation, and multiple laser ablation method modifications, including femtosecond laser direct writing, direct laser interference ablation, and single pulse ablation. The advantages and drawbacks of the different approaches are discussed in detail to highlight the most promising techniques for the fabrication of antireflection microstructures capable of achieving 99% transmittance in the 2–16 μm range.

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