Corrosion Mitigation Coatings for RF Sources and Components

Ives, R. Lawrence; Oldham, Christopher J.; Daubert, James S.; Gremaud, Antoine P.; Collins, George; Marsden, David; Bui, Thuc; Fusco, Michael A.; Mitsdarffer, Bryan; Parsons, Gregory N.

doi:10.1109/ted.2017.2788379

Cited by 5 publications

(2 citation statements)

References 6 publications

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“…However, this modeling has not been confirmed experimentally and the aspect ratio considered was too low to respond to larger needs in piping. Recently corrosion mitigation coatings were deposited by ALD on the interior surface in a complex cooling circuit [24]. However, ALD is essentially adapted to the growth of metal oxides and it still suffers from very low growth rates, which is problematic for developing protective coatings about 10 µm thick.…”

Section: Introductionmentioning

confidence: 99%

Chromium Carbide Growth by Direct Liquid Injection Chemical Vapor Deposition in Long and Narrow Tubes, Experiments, Modeling and Simulation

et al. 2018

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Chromium carbide layers were deposited using liquid-injection metal-organic chemical vapor deposition inside long (0.3 to 1 m) and narrow (8 to 24 mm in diameter) metallic tubes. The deposition was carried out using a molecular single-source, bis(benzene)chromium (BBC), as representative of the bis(arene)metal family diluted in toluene and injected with N 2 as carrier gas. A multicomponent mass transport model for the simulation of the coupled fluid flow, heat transfer and chemistry was built. The kinetic mechanism of the growth of CrC x films was developed with the help of large-scale experiments to study the depletion of the precursors along the inner wall of the tube. The model fits well in the 400-550 • C temperature range and in the 1.3 × 10 2 to 7 × 10 3 Pa pressure range. The pressure is shown to have a pronounced effect on the deposition rate and thickness uniformity of the resulting coating. Below 525 • C the structure, composition and morphology of the films are not affected by changes of total pressure or deposition temperature. The coatings are amorphous and their Cr:C ratio is about 2:1, i.e., intermediate between Cr 7 C 3 and Cr 3 C 2. The model was applied to the design of a long reactor (1 m), with a double injection successively and alternatively undertaken at each end to ensure the best uniformity with sufficient thickness. This innovative concept can be used to optimize industrial deposition processes inside long and narrow tubes and channels.

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Section: Introductionmentioning

confidence: 99%

Chromium Carbide Growth by Direct Liquid Injection Chemical Vapor Deposition in Long and Narrow Tubes, Experiments, Modeling and Simulation

et al. 2018

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“…ALD has achieved industrial applications in displays, microelectronics and solar energy with its unique characteristics of precise thickness control, uniformity and conformality [22][23][24]. For vehicles, ALD has been performed to prepare precious metal or metal oxide nano coatings to improve the performance of micro-electro-mechanical system, such as capacitive sensor, micro-resonator and highpower radar [25][26][27]. The structure components can be modified by ALD coatings to increase the mechanic strength and corrosion resistance [28][29][30][31].…”

Section: Introductionmentioning

confidence: 99%

Atomic-scale engineering of advanced catalytic and energy materials via atomic layer deposition for eco-friendly vehicles

Liu¹,

Su²,

Chen³

2023

Int. J. Extrem. Manuf.

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Zero-emission eco-friendly vehicles with partly or fully electric powertrains have exhibited rapidly increased demand for reducing the emissions of air pollutants and improving the energy efficiency. Advanced catalytic and energy materials are essential as the significant portions in the key technologies of eco-friendly vehicles, such as the exhaust emission control system, power lithium ion battery and hydrogen fuel cell. Precise synthesis and surface modification of the functional materials and electrodes are required to satisfy the efficient surface and interface catalysis, as well as rapid electron/ion transport. Atomic layer deposition (ALD), an atomic and close to-atomic scale manufacturing method, shows unique characteristics of precise thickness control, uniformity and conformality for film deposition, which has emerged as an important technique to design and engineer advanced catalytic and energy materials. This review has summarized recent process of ALD on the controllable preparation and modification of metal and oxide catalysts, as well as lithium ion battery and fuel cell electrodes. The enhanced catalytic and electrochemical performances are discussed with the unique nanostructures prepared by ALD. Recent works on ALD reactors for mass production are highlighted. The challenges involved in the research and development of ALD on the future practical applications are presented, including precursor and deposition process investigation, practical device performance evaluation, large-scale and efficient production, etc.

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