Corrigendum: Evidence of ion energy distribution shift in HiPIMS plasmas with positive pulse (2019 <i>Plasma Sources Sci. Technol.</i> <b>28</b> 01LT03)

Avino, Fabio; Sublet, A.; Taborelli, M.

doi:10.1088/1361-6595/ab2b1d

Cited by 7 publications

(3 citation statements)

References 24 publications

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“…From these data it is clear that the group P2 presents a constant energy shift of about 22 eV with the group P3 for all experiments when U + is applied to the target. Such energy shift has been reported in the literature [52,54,55].…”

Section: Ion Energy Groupssupporting

confidence: 81%

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A poly-diagnostic study of bipolar high-power magnetron sputtering: role of electrical parameters

Michiels¹,

Snyders²,

Britun³

2020

J. Phys. D: Appl. Phys.

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Ion acceleration in a bipolar high-power impulse magnetron sputtering discharge working with Ar gas and using a Ti cathode has been investigated. The multiple discharge diagnostic approaches have been implemented, including the target and substrate current probe measurements, mass spectrometry and laser-induced fluorescence. In particular, the current waveforms were analysed in detail, showing the particularities of the current evolution during the negative (plasma) and positive voltage pulses. It is shown that the substrate current during the positive voltage pulse reveals two peaks, corresponding, as suggested, to two groups of the positive ions repulsed from the cathode by the applied positive potential. These observations correlate well with the mass spectrometry measurements as well as with the two-dimensional ion density mapping performed for several discharge conditions by laser-induced fluorescence imaging technique.

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Section: Ion Energy Groupssupporting

confidence: 81%

“…• Group P2: Two hypotheses can be formulated to explain this high energy group. First, it can be attributed to the plasma-off time where the plasma potential settles at relatively small positive value [52]. It results in acceleration of ions to a slightly higher energy.…”

Section: Ion Energy Groupsmentioning

confidence: 99%

A poly-diagnostic study of bipolar high-power magnetron sputtering: role of electrical parameters

Michiels¹,

Snyders²,

Britun³

2020

J. Phys. D: Appl. Phys.

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“…In this pulsing scheme ions generated during the negative voltage pulse are accelerated towards the substrate during the positive voltage pulse [12,13]. Mass-spectrometry studies [13][14][15][16][17][18][19][20][21][22][23] have shown that the ion energy gain is proportional to the applied positive voltage U + and the high-energy peak in the recorded IEDFs is roughly at an energy of ΔE acc = qU + . Some studies [15,[19][20][21]23] also observed additional distinct peak/peaks in the recorded IEDFs at lower energies.…”

Section: Introductionmentioning

confidence: 99%

Dynamics of bipolar HiPIMS discharges by plasma potential probe measurements

Zanáška

Lundin

Brenning

et al. 2022

Plasma Sources Sci. Technol.

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The plasma potential at a typical substrate position is studied during the positive pulse of a bipolar high-power impulse magnetron sputtering (bipolar HiPIMS) discharge with a Cu target. The goal of the study is to identify suitable conditions for achieving ion acceleration independent on substrate grounding. We find that the time-evolution of the plasma potential during the positive pulse can be separated into several distinct phases, which are highly dependent on the discharge conditions. This includes exploring the influence of the working gas pressure (0.3 – 2 Pa), HiPIMS peak current (10 – 70 A corresponding to 0.5 – 3.5 A/cm2), HiPIMS pulse length (5 – 60 μs) and the amplitude of the positive voltage U+ applied during the positive pulse (0 – 150 V). At low enough pressure, high enough HiPIMS peak current and long enough HiPIMS pulse length, the plasma potential at a typical substrate position is seen to be close to 0 V for a certain time interval (denoted phase B) during the positive pulse. At the same time, spatial mapping of the plasma potential inside the magnetic trap region revealed an elevated value of the plasma potential during phase B. These two plasma potential characteristics are identified as suitable for achieving ion acceleration in the target region. Moreover, by investigating the target current and ion saturation current at the chamber walls, we describe a simple theory linking the value of the plasma potential profile to the ratio of the available target electron current and ion saturation current at the wall.

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Understanding the ion acceleration mechanism in bipolar HiPIMS: the role of the double layer structure developed in the after-glow plasma

Tiron

Velicu

2020

Plasma Sources Sci. Technol.

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The physical vapor deposition techniques are nowadays widely used at industrial scale to produce thin films and surface coatings. Despite their proven utilities and benefits, these techniques still need to be improved in order to build other exigent and innovative coating systems, able to satisfy the market demand and to meet modern society's needs. In this context, the bipolar high power impulse magnetron sputtering (BP-HiPIMS) technology is gaining ground and popularity due to its extraordinary ability to control the energy of the incoming ion flux to the growing film, enabling an energy-enhanced deposition process thanks to the existence of a dynamic double layer (DL) structure which develops in the after-glow plasma. In this work, the HiPIMS discharge was operated in bipolar mode, in which the negative pulses are followed by positive pulses whose amplitude, duration and delay can be independently controlled. The temporal and spatial evolutions of the plasma potential in BP-HiPIMS discharge were investigated using an emissive probe. Energy-resolved mass spectrometry was used to study the influence of the pulsing configuration (positive/negative pulse duration) on the energy distribution and flux of the ionic species bombarding the substrate. It was found that the ion energy distributions and ion flux were mainly determined by the specific time-and-space evolution of the plasma potential throughout the cycle of the voltage pulses applied to the target and the spatial distribution of the ions at the onset of the positive pulse. The ion propagation dynamics is strongly related to the potential drop across the DL structure whose characteristic features are mainly influenced by the amplitude and duration of the positive pulse. Short negative HiPIMS pulses followed by short and highly positive reverse pulses are favorable for an efficient acceleration mechanism of the metal ions in the potential drop of the DL.

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Corrigendum: Evidence of ion energy distribution shift in HiPIMS plasmas with positive pulse (2019 Plasma Sources Sci. Technol. 28 01LT03)

Abstract: Figure 3. Time-integrated EDFs of Nb + for the case without PP, +50 V PP of 100 μs, and 250 μs duration.

Cited by 7 publications

References 24 publications

A poly-diagnostic study of bipolar high-power magnetron sputtering: role of electrical parameters

A poly-diagnostic study of bipolar high-power magnetron sputtering: role of electrical parameters

Dynamics of bipolar HiPIMS discharges by plasma potential probe measurements

Understanding the ion acceleration mechanism in bipolar HiPIMS: the role of the double layer structure developed in the after-glow plasma

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