2011 IEEE 57th Holm Conference on Electrical Contacts (Holm) 2011
DOI: 10.1109/holm.2011.6034804
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Correlation of Intrinsic Thin Film Stress Evolution and IMC Growth with Whisker Growth

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Cited by 6 publications
(2 citation statements)
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“…Also, we did not observe any features between the layers that can be identified as intermetallic compounds (IMCs) [4,14,22]. The formation of IMCs is often considered solely responsible for, or at least contributing to, the whiskers growth although there are contradicting observations [37][38][39]. EDS analysis was performed to confirm the chemical composition of the deposited films.…”
Section: Resultsmentioning
confidence: 84%
“…Also, we did not observe any features between the layers that can be identified as intermetallic compounds (IMCs) [4,14,22]. The formation of IMCs is often considered solely responsible for, or at least contributing to, the whiskers growth although there are contradicting observations [37][38][39]. EDS analysis was performed to confirm the chemical composition of the deposited films.…”
Section: Resultsmentioning
confidence: 84%
“…The stress of the ITO film during sputtering and annealing was measured by a film stress test system. The film stress [6] test system measures the curvature change of the substrate before and after sputtering and annealing through double-beam scanning, so as to obtain the film stress.…”
Section: Characterizationmentioning
confidence: 99%