2005
DOI: 10.1016/j.surfcoat.2005.01.050
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Correlation between the characteristics of a pulsed microwave plasma used for diamond growth and the properties of the produced films

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Cited by 9 publications
(9 citation statements)
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“…The temperature was measured by means of an infrared bicolor pyrometer. The gas mixture composition was ensured by mass flowmeters that were computer-controlled in order to maintain both the CH 4 -H 2 ratio and the total pressure at constant values [10,13].…”
Section: Methodsmentioning
confidence: 99%
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“…The temperature was measured by means of an infrared bicolor pyrometer. The gas mixture composition was ensured by mass flowmeters that were computer-controlled in order to maintain both the CH 4 -H 2 ratio and the total pressure at constant values [10,13].…”
Section: Methodsmentioning
confidence: 99%
“…The difference between these two techniques is that the first is able to independently control the plasma density as well as the degree of dissociation, while the second controls the surface chemistry and the growth mechanisms. In this study, we have developed an MPACVD system using a continuous microwave source at 2.45 GHz and have obtained interesting results for diamond growth, especially by studying the role of atomic hydrogen in such a process [8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…For this application, microwave plasma discharge is produced using feed gas consisting mainly of hydrogen and a few percents of hydrocarbon species such as methane. Hydrogen atoms constitute the main governing species for diamond deposition [1,3,5,7,19,20,29,31], this is due to the high reactivity of these atoms produced by electron impact dissociation of molecular hydrogen [5].…”
Section: Introductionmentioning
confidence: 99%
“…However, it is not easy to prepare specific polymers such as heterocyclic polymers due to sensitive chemical groups. It has been proposed that pulsed plasma interactions with substrates result in higher retention of the monomer structure compared with continuous wave (CW) plasma polymerization [11]. Since pulsing the plasma excitation varies the degree of ion bombardment, film and gas phase composition can be better controlled in pulsed glow discharge.…”
Section: Introductionmentioning
confidence: 99%