Correlation between reticle- and wafer-CD difference of multiple
28nm reticle-sites

Guo, Ningqun; Richter, Frank; Thamm, Thomas; Ackmann, Paul; Staples, Marc; Weisbuch, François; Kurth, Karin; Schenker, Joerg; Leschok, Andre; Gn, Fang Hong

doi:10.1117/12.964376

SPIE Proceedings

2012

DOI: 10.1117/12.964376

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Correlation between reticle- and wafer-CD difference of multiple 28nm reticle-sites

Ningqun Guo

Frank Richter

Thomas Thamm

et al.

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Correlation between reticle- and wafer-CD difference of multiple 28nm reticle-sites

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