Hard BCN films were deposited by chemical vapour deposition (CVD) on Si(100) substrates. TCVD (thermal activated) and PECVD (GD or RF microwave plasma-activated, respectively) were used. The films were analysed with respect to chemical state, composition, morphology and microstructure, oxidation behaviour and hardness. Wavelength dispersive X-ray spectroscopy (EPMA), infrared spectroscopy (IR), transmission electron microscopy (TEM), differential thermal analysis (DTA) and hardness evaluation were employed for film characterization. A correlation between deposition parameters and film composition, structure and hardness could be proved in every CVD process. Parallels between TCVD and PECVD films emerged in the case of chemical composition and the correlation between carbon content and hardness values. Considerable differences exist with regard to the microstructure, especially the texture of the films. Moreover in TCVD films the carbon is preferentially incorporated between the BN basal planes, whereas in PECVD films it is incorporated preferentially in as well as between the BN basal planes.

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