Comprehensive Coordination Chemistry II 2003
DOI: 10.1016/b0-08-043748-6/09005-8
|View full text |Cite
|
Sign up to set email alerts
|

Coordination Complexes as Precursors for Semiconductor Films and Nanoparticles

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
5
0

Year Published

2005
2005
2022
2022

Publication Types

Select...
7
3

Relationship

0
10

Authors

Journals

citations
Cited by 14 publications
(5 citation statements)
references
References 358 publications
0
5
0
Order By: Relevance
“…Many metal chalcogenide materials can be deposited via chemical vapor deposition (CVD) techniques, and this has stimulated a large amount of work on the development of tailored CVD precursors for their production. Compounds such as metal thiolates and selenolates have been shown to be useful reagents for single source CVD of metal sulfide and selenide thin films. , O’Brien and co-workers have developed single source precursors for CVD of metal sulfide and selenide films and nanoparticles based upon molecular dialkyldithiocarbamato and dialkyldiselenocarbamato complexes. , Parkin, Carmalt, and co-workers have also obtained metal selenide films via dual source atmospheric pressure CVD from SeEt 2 with volatile metal chlorides or amides . A small number of neutral selenoether (SeR 2 ) single source reagents for low pressure CVD of the layered metal selenide semiconductors TiSe 2 and SnSe 2 have also been reported. We have shown in our recent work that the distorted octahedral [SnCl 4 { n BuSe(CH 2 ) n Se n Bu}] ( n = 2 or 3) complexes serve as single source LPCVD precursors for highly area selective deposition of single phase, crystalline SnSe 2 onto the conducting TiN regions within photolithographically patterned SiO 2 /TiN substrates …”
Section: Introductionmentioning
confidence: 99%
“…Many metal chalcogenide materials can be deposited via chemical vapor deposition (CVD) techniques, and this has stimulated a large amount of work on the development of tailored CVD precursors for their production. Compounds such as metal thiolates and selenolates have been shown to be useful reagents for single source CVD of metal sulfide and selenide thin films. , O’Brien and co-workers have developed single source precursors for CVD of metal sulfide and selenide films and nanoparticles based upon molecular dialkyldithiocarbamato and dialkyldiselenocarbamato complexes. , Parkin, Carmalt, and co-workers have also obtained metal selenide films via dual source atmospheric pressure CVD from SeEt 2 with volatile metal chlorides or amides . A small number of neutral selenoether (SeR 2 ) single source reagents for low pressure CVD of the layered metal selenide semiconductors TiSe 2 and SnSe 2 have also been reported. We have shown in our recent work that the distorted octahedral [SnCl 4 { n BuSe(CH 2 ) n Se n Bu}] ( n = 2 or 3) complexes serve as single source LPCVD precursors for highly area selective deposition of single phase, crystalline SnSe 2 onto the conducting TiN regions within photolithographically patterned SiO 2 /TiN substrates …”
Section: Introductionmentioning
confidence: 99%
“…Liu and co-workers have reported several selenium-centered clusters of Cu I , Ag I , and Zn II using dialkyl diselenophosphates (dsep) with nuclearities ranging from 4 to 11, which involve the rupture of the P−Se bond to generate such clusters . These clusters as well as their sulfur counterparts indeed possess potential in several technological applications and have drawn many biological interests …”
Section: Introductionmentioning
confidence: 99%
“…QDs, as a modern type of nanomaterials, are used for optical image analysis. An example is nanocrystalline semiconductor materials, usually made of metallic materials such as zinc or cadmium from sulfides or selenides, which vary in diameter between 2 and 10 nanometers [221][222][223]. The wavelength ranges of the radiation generated do not depend on the QD components, but rather on the structural aspects of the QDs.…”
Section: Nanostructures As Carriers For Image Processingmentioning
confidence: 99%