2009
DOI: 10.1109/lpt.2008.2008629
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Controlling Third-Order Nonlinearities by Ion-Implantation Quantum-Well Intermixing

Abstract: Abstract-The optical Kerr effect was measured by observing self-phase modulation in GaAs-AlGaAs superlattice-core waveguides modified by ion-implantation quantum-well intermixing. The band-gap energy was shifted by 68 nm for an implantation dose of 0 5 10 13 cm 2 and annealing temperature of 775 C. The Kerr effect was suppressed by up to 71% in the transverse-electric polarization after intermixing. A reduced polarization dependence of the self-phase modulation was observed after intermixing.Index Terms-Nonlin… Show more

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Cited by 15 publications
(19 citation statements)
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“…Notice that the resulting round-trip time in the cavity is still much shorter than the lifetime, thus Ikeda instabilities would require power and detuning values incompatible with the present analysis. The medium is a semiconductor of refractive index 3.48, Kerr index n 2 = 2 × 10 −17 m 2 /W [22], thus we getχ = 2.90 × 10 22 [Js] −1 . The scaling intensity results I 0 = 34.4 fJ.…”
mentioning
confidence: 99%
“…Notice that the resulting round-trip time in the cavity is still much shorter than the lifetime, thus Ikeda instabilities would require power and detuning values incompatible with the present analysis. The medium is a semiconductor of refractive index 3.48, Kerr index n 2 = 2 × 10 −17 m 2 /W [22], thus we getχ = 2.90 × 10 22 [Js] −1 . The scaling intensity results I 0 = 34.4 fJ.…”
mentioning
confidence: 99%
“…This allows pump lasers to be mixed with passive optical components. However, the intermixing process has also been shown to alter the nonlinear optical properties of the quantum well structure [69]. Furthermore, the absorption/emission band and nonlinear strength can be manipulated with varying degrees of intermixing on the same chip [70], opening the possibility of monolithic integration of complex photonic integrated circuits and systems.…”
Section: Quantum Well Intermixingmentioning
confidence: 99%
“…We also eliminated a pair of AQWs by terminating the superlattice at either end with barrier layers of Al 0 85 Ga 0 15 As instead of well layers of GaAs. This removed a parasitic two-photon absorption peak present in the original wafer design [69]. Secondly, the IID and RTA processes were optimized to provide an appropriate balance between optical losses and bandgap shift.…”
Section: Recent Improvements and Performancementioning
confidence: 99%
“…However, ion implantation has adverse influence on the crystal quality, and the caused damage should be improved by the optimized annealing parameters to meet the demand of device fabrication. Many ions such as P [10], As [11], He [12], and H [13] can be applied in the ion implantation induced QWI. Whereas P and As are commonly used given preference to their impurity-free M A N U S C R I P T A C C E P T E D ACCEPTED MANUSCRIPT introduction, their low diffusion coefficient can result in irreparable implantation damage, which may degrade the device performance [12].…”
Section: Introductionmentioning
confidence: 99%
“…However, ion implantation has adverse influence on the crystal quality, and the caused damage should be improved by the optimized annealing parameters to meet the demand of device fabrication. Many ions such as P [10], As [11], He [12], and H [13] can be applied in the ion implantation induced QWI. Whereas P and As are commonly used given preference to their impurity-free…”
mentioning
confidence: 99%