2023
DOI: 10.1016/j.tsf.2023.139781
|View full text |Cite
|
Sign up to set email alerts
|

Controlling the optical properties of hafnium dioxide thin films deposited with electron cyclotron resonance ion beam deposition

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
5

Relationship

1
4

Authors

Journals

citations
Cited by 5 publications
(2 citation statements)
references
References 45 publications
0
2
0
Order By: Relevance
“…Even in the absence of oxygen being introduced into the vacuum chamber during the procedure, all the coatings manufactured display a significant oxygen content in the range of 13%-17%. This percentage includes the native oxide layer on the surface that forms after exposing the substrate to air (during the transfer from the coating chamber to the EDS measurements), the interstitial O 2 that gets trapped in the coatings in a form of bubble due to the IBD process [40,41] as well as the dissociated oxygen that gets bonded to the nitrogen and silicon atoms. For fixed beam energy, the oxygen concentration is almost invariable up to 800 • C and increases from 800 • C to 900 • C for all samples suggesting that the refractive index change for temperature below 800 • C is mostly due to the structure change of the silicon (oxy)nitride.…”
Section: Optical Absorption Of Sinx Coatingsmentioning
confidence: 99%
“…Even in the absence of oxygen being introduced into the vacuum chamber during the procedure, all the coatings manufactured display a significant oxygen content in the range of 13%-17%. This percentage includes the native oxide layer on the surface that forms after exposing the substrate to air (during the transfer from the coating chamber to the EDS measurements), the interstitial O 2 that gets trapped in the coatings in a form of bubble due to the IBD process [40,41] as well as the dissociated oxygen that gets bonded to the nitrogen and silicon atoms. For fixed beam energy, the oxygen concentration is almost invariable up to 800 • C and increases from 800 • C to 900 • C for all samples suggesting that the refractive index change for temperature below 800 • C is mostly due to the structure change of the silicon (oxy)nitride.…”
Section: Optical Absorption Of Sinx Coatingsmentioning
confidence: 99%
“…Hafnium oxide is commonly used in electronics because of its high dielectric constant. It has a wide band gap (>5 eV) [4], high refractive index [5], and has been used extensively as antireflection and optical coatings for interference filters [6,7]. HfO 2 is also a high-density material (~10 g/cm 3 ), and, when activated with rare earth elements (i.e., Eu 3+ ), acts as good scintillating materials and thermal barrier coatings for operation in harsh and high-temperature environments [8][9][10][11][12].…”
Section: Introductionmentioning
confidence: 99%