2003
DOI: 10.1016/s0168-583x(02)02183-3
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Controlling the nanoscale morphology of organic films deposited by polyatomic ions

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Cited by 25 publications
(43 citation statements)
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“…The described approach to the inclusion of the background at large angles and the geometrical factor at small angles makes it possible to obtain the angular dependence of the reflection coefficient of X-rays in the range of 1 to 10 −8 , which is comparable with results obtained on modern synchrotron stations [11,[16][17][18][19][20][21]. Such a result is certainly achieved not only by improving the method of experiment but also by increasing its time, which does not nevertheless exceed 10 h.…”
supporting
confidence: 66%
“…The described approach to the inclusion of the background at large angles and the geometrical factor at small angles makes it possible to obtain the angular dependence of the reflection coefficient of X-rays in the range of 1 to 10 −8 , which is comparable with results obtained on modern synchrotron stations [11,[16][17][18][19][20][21]. Such a result is certainly achieved not only by improving the method of experiment but also by increasing its time, which does not nevertheless exceed 10 h.…”
supporting
confidence: 66%
“…At qz < qc ≈ 0.022 Å1 the incident beam undergoes total external reflection, R ≈ 1. Thus, the data for the reflectivity R(qz) collected on the diffractometer are comparable in spatial resolution 2π/q max z ≈ 10 Å (q max z ≈ 0.7 Å−1 is the maximum value of qz in our experiment) to the data obtained previously for various planar systems using synchrotron radiation [12][13][14][15][16][17][18].…”
supporting
confidence: 83%
“…Модельный профиль электронной плотности ρ(z) соответствующий (6) строится на основе функции ошибок erf(t) [15,[19][20][21][22][23]. При этом показатель степени σ R в экспоненциальном множителе имеет смысл среднеквадратичного отклонения положения j-ой границы модельного мультислоя от номинального значения z j (см.…”
Section: Doi: 107868/s0370274x17120062unclassified