2011
DOI: 10.1021/nl103418q
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Controlled Growth of Ordered Nanopore Arrays in GaN

Abstract: High-quality, ordered nanopores in semiconductors are attractive for numerous biological, electrical, and optical applications. Here, GaN nanorods with continuous pores running axially through their centers were grown by organometallic vapor phase epitaxy. The porous nanorods nucleate on an underlying (0001)-oriented GaN film through openings in a SiN(x) template that are milled by a focused ion beam, allowing direct placement of porous nanorods. Nanopores with diameters ranging from 20-155 nm were synthesized… Show more

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Cited by 10 publications
(7 citation statements)
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“…22 There are plenty of methods for manufacturing porous IIInitride materials. Dry etching methods are widely used and include reactive ion etching 23,24 and hydrogen etching. 25 However, dry etching treatment may cause a few unintended damages to samples.…”
Section: Introductionmentioning
confidence: 99%
“…22 There are plenty of methods for manufacturing porous IIInitride materials. Dry etching methods are widely used and include reactive ion etching 23,24 and hydrogen etching. 25 However, dry etching treatment may cause a few unintended damages to samples.…”
Section: Introductionmentioning
confidence: 99%
“…More importantly, the resulting nanowire-to-electrode or nanowire-to-nanowire connections are inherently random and inconsistent. Porous electrodes may also be formed by using electron beam (e-beam) lithography [15] or focused-ion-beam (FIB) milling [16], but the serial and time-intensive nature of such processes preclude them from being used in large-area or large-batch applications.…”
Section: Introductionmentioning
confidence: 99%
“…The interaction of FIB with the GaN surface is a complex process which requires a separate in-depth study. The nucleation of ZnO from the trenches milled by FIB is affected by dissociation of the surface nitrogen atoms on the GaN surface [8], amorphization of the GaN surface [40], implantation of Ga [41], and the localization of the nucleation to the interface of GaN with the resist [42]. The configurations of both plain and patterned interfaces should be carefully considered to answer the question why the rectifying I-V characteristics are observed only on the patterned substrates.…”
Section: The Impact Of Fib On the Nucleation Of Zno Nanorods And On Tmentioning
confidence: 99%